Inventor · disambiguated record
Ryoh Kawana
Also filed as: KAWANA RYOH
8 granted patents·3 pending applications·14 citations·filing 2015–2024
79Inventor score
Files withNUFLARE TECHNOLOGY INC11
Top patents by PatentIndex Score
11 records- 0186US11556061B2Multiple charged particle beam writing apparatus and multiple charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2021·Granted Jan 17, 2023·1 cites·10 claims
- 0286US9899187B2Charged particle beam writing apparatus and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2016·Granted Feb 20, 2018·4 cites·10 claims
- 0381US10134562B2Multi charged particle beam writing apparatus, and multi charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2015·Granted Nov 20, 2018·3 cites·12 claims
- 0480US9601315B2Multiple charged particle beam lithography apparatus and multiple charged particle beam pattern writing methodNUFLARE TECHNOLOGY INC·Filed 2015·Granted Mar 21, 2017·3 cites·10 claims
- 0577US9852876B2Multi charged particle beam writing apparatus and multi charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2017·Granted Dec 26, 2017·2 cites·16 claims
- 0667US10483087B2Multi charged particle beam writing apparatus and multi charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2017·Granted Nov 19, 2019·1 cites·2 claims
- 0762US2025087452A1Multiple charged particle beam writing apparatus and multiple charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2024·Application pending·0 cites
- 0861US2024429022A1Multiple charged particle beam writing apparatus and multiple charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2024·Application pending·0 cites
- 0956US12412730B2Multi-charged particle beam writing apparatus and multi-charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2022·Granted Sep 9, 2025·0 cites·10 claims
- 1053US2024242932A1Multi-charged particle beam writing apparatus, and multi-charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2024·Application pending·0 cites
- 1141US10248031B2Multiple charged particle beam lithography apparatus and multiple charged particle beam pattern writing methodNUFLARE TECHNOLOGY INC·Filed 2018·Granted Apr 2, 2019·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →