Inventor · disambiguated record
Ryuji Koitabashi
Also filed as: KOITABASHI RYUJI
15 granted patents·5 pending applications·101 citations·filing 2003–2017
91Inventor score
Top patents by PatentIndex Score
20 records- 0196US9075306B2Chemically amplified negative resist composition and patterning processTAKEDA TAKANOBU·Filed 2011·Granted Jul 7, 2015·22 cites·8 claims
- 0295US8343694B2Photomask blank, resist pattern forming process, and photomask preparation processSHINETSU CHEMICAL CO·Filed 2011·Granted Jan 1, 2013·11 cites·6 claims
- 0392US7977027B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jul 12, 2011·15 cites·3 claims
- 0482US7501223B2Polymer, resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 10, 2009·20 cites·23 claims
- 0578US8110335B2Resist patterning process and manufacturing photo maskTAKEDA TAKANOBU·Filed 2009·Granted Feb 7, 2012·6 cites·9 claims
- 0674US7312016B2Chemically amplified positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Dec 25, 2007·11 cites·9 claims
- 0772US8475978B2Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material filmYOSHIKAWA HIROKI·Filed 2011·Granted Jul 2, 2013·2 cites·16 claims
- 0861US9091931B2Photomask blank and method for manufacturing photomaskKOJIMA YOSUKE·Filed 2012·Granted Jul 28, 2015·1 cites·6 claims
- 0956US7288363B2Chemically amplified positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Oct 30, 2007·4 cites·9 claims
- 1055US8367295B2Preparation process of chemically amplified resist compositionSHINETSU CHEMICAL CO·Filed 2008·Granted Feb 5, 2013·0 cites·7 claims
- 1154US2008305411A1Photomask blank, resist pattern forming process, and photomask preparation processSHINETSU CHEMICAL CO·Filed 2008·Application pending·0 cites
- 1254US2008241751A1Chemically amplified negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Application pending·0 cites
- 1351US6861198B2Negative resist material and pattern formation method using the sameSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 1, 2005·9 cites·22 claims
- 1448US8753786B2Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blankSHINETSU CHEMICAL CO·Filed 2012·Granted Jun 17, 2014·0 cites·9 claims
- 1545US8753787B2Light pattern exposure method, photomask, and photomask blankSHINETSU CHEMICAL CO·Filed 2012·Granted Jun 17, 2014·0 cites·9 claims
- 1644US2007111139A1Negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2006·Application pending·0 cites
- 1744US2016216603A1Container for storing photomask blanksSHINETSU POLYMER CO·Filed 2014·Application pending·0 cites
- 1842US2006166133A1Negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2006·Application pending·0 cites
- 1939US10768524B2Photomask blank substrate container, method for storing photomask blank substrate and method for transporting photomask blank substrateSHINETSU CHEMICAL CO·Filed 2017·Granted Sep 8, 2020·0 cites·6 claims
- 2038US8858814B2Photomask blank, processing method, and etching methodWATANABE SATOSHI·Filed 2010·Granted Oct 14, 2014·0 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →