Inventor · disambiguated record
Ryo Mitsui
Also filed as: Mitsui Ryo
8 granted patents·9 pending applications·9 citations·filing 2017–2025
77Inventor score
Files withSHINETSU CHEMICAL CO17
Top patents by PatentIndex Score
17 records- 0196US11485824B2Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Nov 1, 2022·4 cites·8 claims
- 0289US10696779B2Silicon-containing compound, urethane resin, stretchable film, and method for forming the sameSHINETSU CHEMICAL CO·Filed 2018·Granted Jun 30, 2020·2 cites·7 claims
- 0385US12332565B2Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning processSHINETSU CHEMICAL CO·Filed 2023·Granted Jun 17, 2025·0 cites·12 claims
- 0485US10717804B2Silicon-containing compound, urethane resin, stretchable film, and method for forming the sameSHINETSU CHEMICAL CO·Filed 2018·Granted Jul 21, 2020·1 cites·13 claims
- 0580US10025180B2Sulfonium compound, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 17, 2018·1 cites·19 claims
- 0673US10754248B2Sulfonium salt, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Aug 25, 2020·1 cites·23 claims
- 0773US2025383600A1Benzenesulfonic acid salt compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0870US2024319598A1Composition For Forming Silicon-Containing Resist Underlayer Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0966US2025289931A1Polyvalent ammonium salt compound, composition for forming silicon-containing resist underlayer film, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1063US2025218768A1Composition For Forming Silicon-Containing Anti-Reflective Film And Patterning MethodSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1163US2025166999A1Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1259US2025237953A1Silicon-containing sulfonium salt compound, composition for forming a silicon-containing resist underlayer film, and patterning processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1357US11914295B2Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Feb 27, 2024·0 cites·23 claims
- 1456US2023305405A1Composition for forming silicon-containing metal hard mask and patterning processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1548US2020115400A1Method for producing silicon compound, and silicon compoundSHINETSU CHEMICAL CO·Filed 2019·Application pending·0 cites
- 1647US11215926B2Sulfonium compound, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Jan 4, 2022·0 cites·19 claims
- 1744US2020090935A1Patterning processSHINETSU CHEMICAL CO·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →