Inventor · disambiguated record
Ryoken Ozawa
Also filed as: OZAWA RYOKEN
1 granted patent·2 pending applications·0 citations·filing 2018–2024
9Inventor score
Files withSHINETSU CHEMICAL CO3
Top patents by PatentIndex Score
3 records- 0155US2024345474A1Method for evaluating reference mark formed on euv mask blankSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0244US10782609B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2018·Granted Sep 22, 2020·0 cites·22 claims
- 0337US2020096856A1Phase shift-type photomask blank and phase shift-type photomaskSHINETSU CHEMICAL CO·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →