Inventor · disambiguated record
Ryouta Saisyo
Also filed as: SAISYO RYOUTA
2 granted patents·2 citations·filing 2009–2010
35Inventor score
Files withMINAMI HISATAKA2
Top patents by PatentIndex Score
2 records- 0163US10796921B2CMP fluid and method for polishing palladiumMINAMI HISATAKA·Filed 2010·Granted Oct 6, 2020·2 cites·18 claims
- 0243US8900473B2Polishing solution for CMP, and method for polishing substrate using the polishing solution for CMPMINAMI HISATAKA·Filed 2009·Granted Dec 2, 2014·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →