Inventor · disambiguated record
Ryuichi Serizawa
Also filed as: SERIZAWA RYUICHI
3 granted patents·10 pending applications·7 citations·filing 2011–2024
54Inventor score
Top patents by PatentIndex Score
13 records- 0183US8507575B2Radiation-sensitive resin composition, polymer, and compoundMATSUMURA NOBUJI·Filed 2011·Granted Aug 13, 2013·7 cites·22 claims
- 0253US2024004297A1Composition and method for manufacturing semiconductor substrateJSR CORP·Filed 2023·Application pending·0 cites
- 0350US2024369931A1Method of manufacturing semiconductor substrate, method for forming resist underlayer film, and cleaning liquidJSR CORP·Filed 2024·Application pending·0 cites
- 0448US2024184203A1Composition for forming resist underlayer film, method for manufacturing semiconductor substrate, and method for forming resist underlayer filmJSR CORP·Filed 2024·Application pending·0 cites
- 0545US12353133B2Silicon-containing composition and method of producing semiconductor substrateJSR CORP·Filed 2022·Granted Jul 8, 2025·0 cites·19 claims
- 0641US2022075267A1Film-forming composition, resist underlayer film, method of forming film, method of forming resist pattern, method of forming organic-underlayer-film reverse pattern, method of producing film-forming composition, and method of forming metal-containing film patternJSR CORP·Filed 2021·Application pending·0 cites
- 0739US2023093664A1Silicon-containing composition and method for manufacturing semiconductor substrateJSR CORP·Filed 2022·Application pending·0 cites
- 0836US2013078571A1Photoresist composition, method for producing photoresist composition, and method for forming resist patternJSR CORP·Filed 2012·Application pending·0 cites
- 0935US2020159121A1Metal-containing film-forming composition, metal-containing film and pattern-forming methodJSR CORP·Filed 2020·Application pending·0 cites
- 1033US2018292753A1Composition for forming silicon-containing film for euv lithography, silicon-containing film for euv lithography, and pattern-forming methodJSR CORP·Filed 2018·Application pending·0 cites
- 1131US8921027B2Radiation-sensitive resin compositionSERIZAWA RYUICHI·Filed 2011·Granted Dec 30, 2014·0 cites·4 claims
- 1229US2020333706A1Patterned substrate-producing methodJSR CORP·Filed 2020·Application pending·0 cites
- 1329US2020218161A1Resist pattern-forming method and substrate-treating methodJSR CORP·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →