Inventor · disambiguated record
Satoshi Dei
Also filed as: DEI SATOSHI
5 granted patents·8 pending applications·1 citations·filing 2009–2025
60Inventor score
Files withJSR CORP13
Top patents by PatentIndex Score
13 records- 0162US10090163B2Inorganic film-forming composition for multilayer resist processes, and pattern-forming methodJSR CORP·Filed 2015·Granted Oct 2, 2018·1 cites·18 claims
- 0257US12312487B2Method for forming protective film, method for manufacturing patterned substrate, and compositionJSR CORP·Filed 2023·Granted May 27, 2025·0 cites·24 claims
- 0353US2024288773A1Method for manufacturing semiconductor substrate, and compositionJSR CORP·Filed 2024·Application pending·0 cites
- 0453US2024142876A1Semiconductor substrate manufacturing method and compositionJSR CORP·Filed 2023·Application pending·0 cites
- 0553US2025251666A1Resist underlayer film-forming composition, and method for manufacturing semiconductor substrateJSR CORP·Filed 2025·Application pending·0 cites
- 0653US2025110407A1Semiconductor substrate manufacturing method, and resist base film forming compositionJSR CORP·Filed 2024·Application pending·0 cites
- 0752US2024255852A1Method for manufacturing semiconductor substrate and compositionJSR CORP·Filed 2024·Application pending·0 cites
- 0846US2010178620A1Inverted pattern forming method and resin compositionJSR CORP·Filed 2009·Application pending·0 cites
- 0945US2010167024A1Negative-tone radiation-sensitive composition, cured pattern forming method, and cured patternJSR CORP·Filed 2009·Application pending·0 cites
- 1041US9329478B2Polysiloxane composition and pattern-forming methodJSR CORP·Filed 2013·Granted May 3, 2016·0 cites·12 claims
- 1140US9434609B2Method for forming pattern, and polysiloxane compositionJSR CORP·Filed 2012·Granted Sep 6, 2016·0 cites·13 claims
- 1238US9126231B2Insulation pattern-forming method and insulation pattern-forming materialJSR CORP·Filed 2012·Granted Sep 8, 2015·0 cites·12 claims
- 1329US2015355546A1Composition for silicon-containing film formation, pattern-forming method, and polysiloxane compoundJSR CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →