Inventor · disambiguated record
Satoru Funato
Also filed as: FUNATO SATORU
13 granted patents·212 citations·filing 1993–2001
92Inventor score
Files withCLARIANT FINANCE BVI LTD4HOECHST JAPAN4AZ ELECTRONIC MATERIALS USA2HOECHST AG2CLARIANT AG1
Top patents by PatentIndex Score
13 records- 0182US6479210B2Chemically amplified resist compositionCLARIANT FINANCE BVI LTD·Filed 1999·Granted Nov 12, 2002·77 cites·5 claims
- 0273US5852128AAcid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materialsCLARIANT AG·Filed 1997·Granted Dec 22, 1998·31 cites·8 claims
- 0367US6284427B1Process for preparing resistsCLARIANT FINANCE BVI LTD·Filed 1998·Granted Sep 4, 2001·18 cites·27 claims
- 0466US6686121B2Process for preparing resistsCLARIANT FINANCE BVI LTD·Filed 2001·Granted Feb 3, 2004·6 cites·7 claims
- 0558US7195863B2Development defect preventing process and materialAZ ELECTRONIC MATERIALS USA·Filed 2001·Granted Mar 27, 2007·8 cites·7 claims
- 0656US5738972ARadiation sensitive compositionHOECHST JAPAN·Filed 1997·Granted Apr 14, 1998·21 cites·19 claims
- 0747US7018785B2Method for forming pattern and treating agent for use thereinAZ ELECTRONIC MATERIALS USA·Filed 2001·Granted Mar 28, 2006·3 cites·8 claims
- 0847US5846690ARadiation-sensitive composition containing plasticizerHOECHST JAPAN·Filed 1996·Granted Dec 8, 1998·11 cites·14 claims
- 0944US6527966B1Pattern forming methodCLARIANT FINANCE BVI LTD·Filed 1999·Granted Mar 4, 2003·11 cites·5 claims
- 1043US5773191ARadiation-sensitive compositionHOECHST JAPAN·Filed 1996·Granted Jun 30, 1998·11 cites·19 claims
- 1142US5406406AMolecular crystal and wavelength conversion devices using the sameHOECHST AG·Filed 1994·Granted Apr 11, 1995·5 cites·6 claims
- 1234US5383050AOrganic nonlinear optical materialHOECHST AG·Filed 1993·Granted Jan 17, 1995·5 cites·3 claims
- 1333US6110639ARadiation-sensitive composition and recording medium using the sameHOECHST JAPAN·Filed 1995·Granted Aug 29, 2000·5 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →