Inventor · disambiguated record
Sadahiro Kishii
Also filed as: KISHII SADAHIRO
17 granted patents·1 pending application·467 citations·filing 1991–2013
94Inventor score
Top patents by PatentIndex Score
18 records- 0197US5624300AApparatus and method for uniformly polishing a waferFUJITSU LTD·Filed 1996·Granted Apr 29, 1997·231 cites·8 claims
- 0295US5562529AApparatus and method for uniformly polishing a waferFUJITSU LTD·Filed 1993·Granted Oct 8, 1996·119 cites·6 claims
- 0378US7701016B2Semiconductor device having device characteristics improved by straining surface of active region and its manufacture methodFUJITSU LTD·Filed 2006·Granted Apr 20, 2010·7 cites·7 claims
- 0477US7951686B2Method of manufacturing semiconductor device having device characteristics improved by straining surface of active regionFUJITSU LTD·Filed 2010·Granted May 31, 2011·4 cites·9 claims
- 0572US7501686B2Semiconductor device and method for manufacturing the sameFUJITSU MICROELECTRONICS LTD·Filed 2006·Granted Mar 10, 2009·6 cites·19 claims
- 0671US5227339AMethod of manufacturing semiconductor substrate and method of manufacturing semiconductor device composed of the substrateFUJITSU LTD·Filed 1991·Granted Jul 13, 1993·45 cites·12 claims
- 0768US7064038B2Semiconductor device and method for fabricating the sameFUJITSU LTD·Filed 2004·Granted Jun 20, 2006·12 cites·33 claims
- 0867US8399295B2Semiconductor device and its manufacture methodKISHII SADAHIRO·Filed 2011·Granted Mar 19, 2013·3 cites·9 claims
- 0956US8702826B2Abrasive agent, method for producing abrasive agents, and electronic deviceFUJITSU LTD·Filed 2013·Granted Apr 22, 2014·0 cites·7 claims
- 1052US7637270B2Method of washing a polished objectFUJITSU LTD·Filed 2006·Granted Dec 29, 2009·0 cites·2 claims
- 1151US8791561B2Semiconductor device and its manufacture methodFUJITSU LTD·Filed 2013·Granted Jul 29, 2014·0 cites·6 claims
- 1250US5763325AFabrication process of a semiconductor device using a slurry containing manganese oxideFUJITSU LTD·Filed 1996·Granted Jun 9, 1998·13 cites·12 claims
- 1346US8067791B2Semiconductor device and method for fabricating the sameKUDO HIROSHI·Filed 2009·Granted Nov 29, 2011·0 cites·3 claims
- 1446US7642577B2Semiconductor device and method for fabricating the sameFUJITSU MICROELECTRONICS LTD·Filed 2005·Granted Jan 5, 2010·0 cites·2 claims
- 1544US6114247APolishing cloth for use in a CMP process and a surface treatment thereofFUJITSU LTD·Filed 1997·Granted Sep 5, 2000·11 cites·9 claims
- 1644US5877089ASlurry containing manganese oxideFUJITSU LTD·Filed 1998·Granted Mar 2, 1999·9 cites·5 claims
- 1741US2003217518A1Abrasive, a method of polishing with the abrasive, and a method of washing a polished objectFUJITSU LTD·Filed 2003·Application pending·0 cites
- 1838US6159858ASlurry containing manganese oxide and a fabrication process of a semiconductor device using such a slurryFUJITSU LTD·Filed 1997·Granted Dec 12, 2000·7 cites·25 claims
Join the waitlist — get patent alerts
Get an alert when Sadahiro Kishii files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →