Inventor · disambiguated record
Satoshi Shimatani
Also filed as: SHIMATANI SATOSHI
12 granted patents·3 pending applications·57 citations·filing 2000–2016
89Inventor score
Top patents by PatentIndex Score
15 records- 0187US9929317B2Deep ultraviolet LED and method for manufacturing the sameMARUBUN CO LTD·Filed 2015·Granted Mar 27, 2018·8 cites·26 claims
- 0285US9806229B2Deep ultraviolet LED and method for manufacturing the sameMARUBUN CO LTD·Filed 2014·Granted Oct 31, 2017·6 cites·8 claims
- 0375US9929311B2Semiconductor light emitting element and method for producing the sameMARUBUN CO LTD·Filed 2014·Granted Mar 27, 2018·4 cites·1 claims
- 0472US6492085B1Positive photoresist composition and process and synthesizing polyphenol compoundTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Dec 10, 2002·10 cites·6 claims
- 0554US7358028B2Chemically amplified positive photo resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Apr 15, 2008·10 cites·10 claims
- 0651US10678129B2Composition for nanoimprint, cured product, pattern forming method, and article having patternTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Jun 9, 2020·0 cites·7 claims
- 0751US6921621B2Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jul 26, 2005·9 cites·17 claims
- 0850US7150956B2Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Dec 19, 2006·3 cites·15 claims
- 0947US6620978B2Positive photoresist composition and process for synthesizing polyphenol compoundTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Sep 16, 2003·1 cites·2 claims
- 1044US6787290B2Positive-working photoresist composition and resist patterning method using sameTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Sep 7, 2004·6 cites·8 claims
- 1138US7192687B2Positive resist composition and method of forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Mar 20, 2007·0 cites·15 claims
- 1235US2002106580A1Method for forming a hole-patterned photoresist layerFiled 2001·Application pending·0 cites
- 1334US2007117045A1Chemical amplification type positive photoresist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2007·Application pending·0 cites
- 1434US2005037291A1Method for forming fine resist patternFiled 2002·Application pending·0 cites
- 1529US7329478B2Chemical amplified positive photo resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Feb 12, 2008·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →