Inventor · disambiguated record
Satoshi Takechi
Also filed as: TAKECHI SATOSHI
32 granted patents·1,017 citations·filing 1989–2006
98Inventor score
Top patents by PatentIndex Score
32 records- 0196US6329125B2Chemically amplified resist compositions and process for the formation of resist patternsFUJITSU LTD·Filed 2000·Granted Dec 11, 2001·154 cites·1 claims
- 0296US6013416AChemically amplified resist compositions and process for the formation of resist patternsFUJITSU LTD·Filed 1996·Granted Jan 11, 2000·164 cites·15 claims
- 0396US5968713AChemically amplified resist compositions and process for the formation of resist patternsFUJITSU LTD·Filed 1997·Granted Oct 19, 1999·165 cites·20 claims
- 0494US6004720ARadiation sensitive material and method for forming patternFUJITSU LTD·Filed 1997·Granted Dec 21, 1999·53 cites·6 claims
- 0592US6200725B1Chemically amplified resist compositions and process for the formation of resist patternsFUJITSU LTD·Filed 1997·Granted Mar 13, 2001·105 cites·8 claims
- 0690US6344304B1Radiation sensitive material and method for forming patternFUJITSU LTD·Filed 1999·Granted Feb 5, 2002·38 cites·4 claims
- 0780US5443690APattern formation material and pattern formation methodFUJITSU LTD·Filed 1994·Granted Aug 22, 1995·45 cites·5 claims
- 0879US7465529B2Radiation sensitive material and method for forming patternFUJITSU LTD·Filed 2006·Granted Dec 16, 2008·3 cites·2 claims
- 0979US5879851AMethod for forming resist patterns by using an ammonium or morpholine compound as a developerFUJITSU LTD·Filed 1996·Granted Mar 9, 1999·42 cites·9 claims
- 1072US6207342B1Chemically amplified resist material and process for the formation of resist patternsFUJITSU LTD·Filed 1998·Granted Mar 27, 2001·42 cites·8 claims
- 1169US7129017B2Chemically amplified resist composition and method for forming patterned film using sameFUJITSU LTD·Filed 2005·Granted Oct 31, 2006·8 cites·16 claims
- 1268US5506088AChemically amplified resist composition and process for forming resist pattern using sameFUJITSU LTD·Filed 1994·Granted Apr 9, 1996·23 cites·4 claims
- 1368US5019485AProcess of using an electrically conductive layer-providing composition for formation of resist patternsFUJITSU LTD·Filed 1989·Granted May 28, 1991·19 cites·14 claims
- 1461US5856071AResist material including si-containing resist having acid removable group combined with photo-acid generatorFUJITSU LTD·Filed 1996·Granted Jan 5, 1999·20 cites·6 claims
- 1559US6790589B2Radiation sensitive material and method for forming patternFUJITSU LTD·Filed 2001·Granted Sep 14, 2004·9 cites·16 claims
- 1659US5153103AResist composition and pattern formation processFUJITSU LTD·Filed 1991·Granted Oct 6, 1992·15 cites·13 claims
- 1758US5326670AProcess for forming resist patternFUJITSU LTD·Filed 1991·Granted Jul 5, 1994·15 cites·4 claims
- 1858US5066751AResist material for energy beam lithography and method of using the sameFUJITSU LTD·Filed 1990·Granted Nov 19, 1991·12 cites·10 claims
- 1956US6887649B2Multi-layered resist structure and manufacturing method of semiconductor deviceFUJITSU LTD·Filed 2002·Granted May 3, 2005·7 cites·20 claims
- 2053US5104479AResist material for energy beam lithography and method of using the sameFUJITSU LTD·Filed 1990·Granted Apr 14, 1992·10 cites·2 claims
- 2152US5403699AProcess for formation of resist patternsFUJITSU LTD·Filed 1993·Granted Apr 4, 1995·11 cites·7 claims
- 2250US6902859B2Chemically amplified resist composition and method for forming patterned film using sameFUJITSU LTD·Filed 2001·Granted Jun 7, 2005·7 cites·9 claims
- 2346US6790580B2Resist material and method for forming a resist pattern with the resist materialFUJITSU LTD·Filed 2002·Granted Sep 14, 2004·6 cites·10 claims
- 2444US7179580B2Radiation sensitive material and method for forming patternFUJITSU LTD·Filed 2004·Granted Feb 20, 2007·3 cites·4 claims
- 2544US5192643APattern-forming method and radiation resist for use when working this pattern-forming methodFUJITSU LTD·Filed 1991·Granted Mar 9, 1993·9 cites·6 claims
- 2642US5068169AProcess for production of semiconductor deviceFUJITSU LTD·Filed 1989·Granted Nov 26, 1991·9 cites·4 claims
- 2740US6699645B2Method for the formation of resist patternsFUJITSU LTD·Filed 1997·Granted Mar 2, 2004·8 cites·14 claims
- 2839US6120977APhotoresist with bleaching effectFUJITSU LTD·Filed 1996·Granted Sep 19, 2000·7 cites·12 claims
- 2937US8257909B2Method of manufacturing semiconductor device, and method of forming resist patternYAMAMOTO HAJIME·Filed 2003·Granted Sep 4, 2012·0 cites·18 claims
- 3032US6248920B1Preparation process for esters and resist materialsFUJITSU LTD·Filed 1997·Granted Jun 19, 2001·4 cites·10 claims
- 3129US7060635B2Method of manufacturing semiconductor device and method of forming patternFUJITSU LTD·Filed 2003·Granted Jun 13, 2006·1 cites·25 claims
- 3229US5087551AProcess for preparing of semiconductor device and pattern-forming coating solution used for this processFUJITSU LTD·Filed 1990·Granted Feb 11, 1992·3 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →