Inventor · disambiguated record
Satoshi Tamai
Also filed as: TAMAI SATOSHI
26 granted patents·8 pending applications·80 citations·filing 2001–2025
93Inventor score
Files withSEIKO EPSON CORP15MITSUBISHI GAS CHEMICAL CO11MUSCLE CORP2TAMAI SATOSHI2INC MITSUBISHI GAS CHEMICAL COMPANY1
Top patents by PatentIndex Score
34 records- 0198US9079413B2Liquid conatiner, liquid consuming apparatus, liquid supply system and liquid container unitSEIKO EPSON CORP·Filed 2013·Granted Jul 14, 2015·25 cites·9 claims
- 0296US9290001B2Liquid container, liquid consuming apparatus, liquid supply system and liquid container unitSEIKO EPSON CORP·Filed 2015·Granted Mar 22, 2016·9 cites·10 claims
- 0395US10112399B2Liquid container, liquid consuming apparatus, liquid supply system and liquid container unitSEIKO EPSON CORP·Filed 2016·Granted Oct 30, 2018·8 cites·12 claims
- 0492US8348263B2Recording medium stacker and recording apparatusSEIKO EPSON CORP·Filed 2011·Granted Jan 8, 2013·13 cites·6 claims
- 0591US10272704B2Medium supporting device and printing apparatusSEIKO EPSON CORP·Filed 2017·Granted Apr 30, 2019·5 cites·15 claims
- 0680US8448942B2Recording medium stacker and recording apparatus with stored second stack memberOTANI AYA·Filed 2011·Granted May 28, 2013·7 cites·6 claims
- 0778US2025198009A1Composition, method for roughening stainless steel surface using same, roughened stainless steel, and method for producing said roughened stainless steelMITSUBISHI GAS CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0874US11173729B2Recording apparatusSEIKO EPSON CORP·Filed 2020·Granted Nov 16, 2021·1 cites·7 claims
- 0967US12468214B2ProjectorSEIKO EPSON CORP·Filed 2023·Granted Nov 11, 2025·0 cites·10 claims
- 1065US11926904B2Aqueous composition, method for roughening stainless steel surface in which same is used, roughened stainless steel, and method for manufacturing sameMITSUBISHI GAS CHEMICAL CO·Filed 2020·Granted Mar 12, 2024·0 cites·3 claims
- 1164US11214084B2Recording apparatusSEIKO EPSON CORP·Filed 2020·Granted Jan 4, 2022·0 cites·9 claims
- 1261US2022251714A1Composition, method for roughening stainless steel surface using same, roughened stainless steel, and method for producing said roughened stainless steelMITSUBISHI GAS CHEMICAL CO·Filed 2020·Application pending·0 cites
- 1360USD686659SPrinterTANAKA YOSHIYUKI·Filed 2012·Granted Jul 23, 2013·11 cites·1 claims
- 1459US11485158B2Transport apparatus and recording apparatusSEIKO EPSON CORP·Filed 2021·Granted Nov 1, 2022·0 cites·14 claims
- 1557US9580818B2Etching liquid for film of multilayer structure containing copper layer and molybdenum layerTAMAI SATOSHI·Filed 2011·Granted Feb 28, 2017·1 cites·17 claims
- 1654US2002010602A1Method for individually renting private car, system to individually rent private car and storage medium storing control program to control sameNEC CORP·Filed 2001·Application pending·0 cites
- 1752US10195882B2Printing apparatusSEIKO EPSON CORP·Filed 2017·Granted Feb 5, 2019·0 cites·9 claims
- 1852US2014014615A1Etching liquid composition for multilayer containing copper and molybdenum and process for etching thereofINC MITSUBISHI GAS CHEMICAL COMPANY·Filed 2013·Application pending·0 cites
- 1952US2025011940A1Roughening solution for rolled copper foil and method for producing roughened copper foilMITSUBISHI GAS CHEMICAL CO·Filed 2022·Application pending·0 cites
- 2051US12308249B2Etching liquid for titanium and/or titanium alloy, method for etching titanium and/or titanium alloy with use of said etching liquid, and method for producing substrate with use of said etching liquidMITSUBISHI GAS CHEMICAL CO·Filed 2021·Granted May 20, 2025·0 cites·9 claims
- 2151US11623463B2Recording apparatusSEIKO EPSON CORP·Filed 2021·Granted Apr 11, 2023·0 cites·5 claims
- 2250US10618326B2Printing apparatusSEIKO EPSON CORP·Filed 2018·Granted Apr 14, 2020·0 cites·14 claims
- 2350US2025163322A1Etching composition and method for producing wiring board using sameMITSUBISHI GAS CHEMICAL CO·Filed 2023·Application pending·0 cites
- 2449US2016186057A1Etching liquid composition for multilayer containing copper and molybdenum and process for etching thereofMITSUBISHI GAS CHEMICAL CO·Filed 2016·Application pending·0 cites
- 2548US9365934B2Liquid composition used in etching copper- and titanium-containing multilayer film, etching method in which said composition is used, method for manufacturing multilayer-film wiring, and substrateMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Jun 14, 2016·0 cites·15 claims
- 2647US9466508B2Liquid composition used in etching multilayer film containing copper and molybdenum, manufacturing method of substrate using said liquid composition, and substrate manufactured by said manufacturing methodMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Oct 11, 2016·0 cites·16 claims
- 2745US11780697B2Recording apparatusSEIKO EPSON CORP·Filed 2020·Granted Oct 10, 2023·0 cites·3 claims
- 2845US11214080B2Recording deviceSEIKO EPSON CORP·Filed 2020·Granted Jan 4, 2022·0 cites·10 claims
- 2944US10045898B2RobotMUSCLE CORP·Filed 2014·Granted Aug 14, 2018·0 cites·17 claims
- 3044US9463654B2Recording apparatusSEIKO EPSON CORP·Filed 2015·Granted Oct 11, 2016·0 cites·9 claims
- 3139US2022285172A1Composition for removing photoresistMITSUBISHI GAS CHEMICAL CO·Filed 2020·Application pending·0 cites
- 3238US9644274B2Etching solution for copper or a compound comprised mainly of copperTAMAI SATOSHI·Filed 2012·Granted May 9, 2017·0 cites·11 claims
- 3335US9777251B2Liquid composition for removing titanium nitride, semiconductor-element cleaning method using same, and semiconductor-element manufacturing methodMITSUBISHI GAS CHEMICAL CO·Filed 2015·Granted Oct 3, 2017·0 cites·21 claims
- 3434US10272006B2Care method and care robot used thereinMUSCLE CORP·Filed 2015·Granted Apr 30, 2019·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →