Inventor · disambiguated record
Satoru Yamazaki
Also filed as: YAMAZAKI SATORU
16 granted patents·311 citations·filing 1992–2018
94Inventor score
Top patents by PatentIndex Score
16 records- 0193US6222195B1Charged-particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 2000·Granted Apr 24, 2001·49 cites·22 claims
- 0278US5391886ACharged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure systemFUJITSU LTD·Filed 1993·Granted Feb 21, 1995·36 cites·18 claims
- 0375US6090527AElectron beam exposure mask and method of manufacturing the same and electron beam exposure methodFUJITSU LTD·Filed 1998·Granted Jul 18, 2000·25 cites·9 claims
- 0475US5830612AMethod of detecting a deficiency in a charged-particle-beam exposure maskFUJITSU LTD·Filed 1996·Granted Nov 3, 1998·28 cites·11 claims
- 0574US5849437AElectron beam exposure mask and method of manufacturing the same and electron beam exposure methodFUJITSU LTD·Filed 1996·Granted Dec 15, 1998·24 cites·19 claims
- 0673US6137111ACharged particle-beam exposure device and charged-particle-beam exposure methodFUJITSU LTD·Filed 1998·Granted Oct 24, 2000·26 cites·41 claims
- 0771US5304811ALithography system using charged-particle beam and method of using the sameFUJITSU LTD·Filed 1992·Granted Apr 19, 1994·23 cites·18 claims
- 0868US5256881AMask and charged particle beam exposure method using the maskFUJITSU LTD·Filed 1992·Granted Oct 26, 1993·20 cites·22 claims
- 0967US5347592APattern judging method and mask producing method using the pattern judging methodFUJITSU LTD·Filed 1992·Granted Sep 13, 1994·19 cites·15 claims
- 1062US5537487APattern judging method, mask producing method, and method of dividing block pattern for use in block exposureFUJITSU LTD·Filed 1994·Granted Jul 16, 1996·16 cites·18 claims
- 1155US5952155AMask and method of creating mask as well as electron-beam exposure method and electron-beam exposure deviceFUJITSU LTD·Filed 1998·Granted Sep 14, 1999·10 cites·37 claims
- 1252US10953419B2Gas atomization nozzle and gas atomization deviceMITSUBISHI HEAVY IND AERO ENGINES LTD·Filed 2018·Granted Mar 23, 2021·0 cites·5 claims
- 1352US5432314ATransparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plateFUJITSU LTD·Filed 1993·Granted Jul 11, 1995·10 cites·20 claims
- 1451US5478157APrinting apparatusSONY CORP·Filed 1994·Granted Dec 26, 1995·19 cites·10 claims
- 1546US5824437AMask and method of creating mask as well as electron-beam exposure method and electron-beam exposure deviceFUJITSU LTD·Filed 1996·Granted Oct 20, 1998·6 cites·30 claims
- 1642US9035170B2Light power generation deviceBRICENO JOSE·Filed 2011·Granted May 19, 2015·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →