Inventor · disambiguated record
Sangchul Yeo
Also filed as: YEO SANGCHUL
2 granted patents·7 pending applications·1 citations·filing 2020–2025
31Inventor score
Files withSAMSUNG ELECTRONICS CO LTD9
Top patents by PatentIndex Score
9 records- 0170US11169437B2Optical proximity correction (OPC) methods and methods of manufacturing masks using the OPC methodsSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Nov 9, 2021·1 cites·20 claims
- 0260US2025165693A1Mask layout design method and mask manufacturing method comprising the design methodSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0359US12299869B2Computing device for predicting a profile using deep learning and operating method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted May 13, 2025·0 cites·19 claims
- 0453US2025321478A1Detection method of weak point and verification method of mask qualitySAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 0551US2024413024A1Pattern inspection device and pattern inspection methodSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0650US2023197460A1Image-based semiconductor device patterning method using deep neural networkSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 0745US2023280646A1Corner rounding method of opc pattern based on deep learning, and opc method and mask manufacturing method including the corner rounding methodSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 0843US2024160827A1Methods of training deep learning models for optical proximity correction, optical proximity correction methods, and methods of manufacturing semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0938US2023132893A1Mask layout correction methods based on machine learning, and mask manufacturing methods including the correction methodsSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →