Inventor · disambiguated record
Scott D. Allen
Also filed as: ALLEN SCOTT · ALLEN SCOTT D · ALLEN SCOTT DAVID · ALLEN SCOTT H
13 granted patents·5 pending applications·129 citations·filing 1993–2014
91Inventor score
Files withIBM12ALLEN SCOTT DAVID2CHARTERED SEMICONDUCTOR MFG1ORACLE INT CORP1STORAGE TECHNOLOGY CORP1
Top patents by PatentIndex Score
18 records- 0190US7786017B1Utilizing inverse reactive ion etching lag in double patterning contact formationIBM·Filed 2009·Granted Aug 31, 2010·19 cites·20 claims
- 0285US8849783B2Storage tape analytics user interfaceORACLE INT CORP·Filed 2014·Granted Sep 30, 2014·10 cites·38 claims
- 0380US8767593B1Method for managing, scheduling, monitoring and controlling audio and video communication and data collaborationALLEN SCOTT DAVID·Filed 2010·Granted Jul 1, 2014·36 cites·117 claims
- 0478US7545041B2Techniques for patterning features in semiconductor devicesIBM·Filed 2006·Granted Jun 9, 2009·4 cites·1 claims
- 0577US7030008B2Techniques for patterning features in semiconductor devicesIBM·Filed 2003·Granted Apr 18, 2006·14 cites·26 claims
- 0675US8625769B1System for managing, scheduling, monitoring and controlling audio and video communication and data collaborationALLEN SCOTT DAVID·Filed 2010·Granted Jan 7, 2014·27 cites·122 claims
- 0774US7494919B2Method for post lithographic critical dimension shrinking using thermal reflow processIBM·Filed 2005·Granted Feb 24, 2009·4 cites·12 claims
- 0871US9093387B1Metallic mask patterning process for minimizing collateral etch of an underlayerIBM·Filed 2014·Granted Jul 28, 2015·2 cites·20 claims
- 0962US7354867B2Etch process for improving yield of dielectric contacts on nickel silicidesIBM·Filed 2005·Granted Apr 8, 2008·1 cites·13 claims
- 1060US5557528ATask prioritization for a tape storage systemSTORAGE TECHNOLOGY CORP·Filed 1993·Granted Sep 17, 1996·12 cites·18 claims
- 1156US8039331B2Opto-thermal annealing methods for forming metal gate and fully silicided gate-field effect transistorsIBM·Filed 2008·Granted Oct 18, 2011·0 cites·8 claims
- 1256US2008187731A1Techniques for Patterning Features in Semiconductor DevicesIBM·Filed 2008·Application pending·0 cites
- 1352US7410852B2Opto-thermal annealing methods for forming metal gate and fully silicided gate field effect transistorsIBM·Filed 2006·Granted Aug 12, 2008·0 cites·1 claims
- 1452US2009008785A1Etch process for improving yield of dielectric contacts on nickel silicidesIBM·Filed 2008·Application pending·0 cites
- 1543US7560387B2Opening hard mask and SOI substrate in single process chamberIBM·Filed 2006·Granted Jul 14, 2009·0 cites·19 claims
- 1643US2004112294A1Magnetic mirror for protection of consumable parts during plasma processingIBM·Filed 2003·Application pending·0 cites
- 1740US2009014807A1Dual stress liners for integrated circuitsCHARTERED SEMICONDUCTOR MFG·Filed 2007·Application pending·0 cites
- 1830US2005035954A1Method and apparatus to facilitate automated transcription of NMR spectra into a textual report using a graphics tabletFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →