Inventor · disambiguated record
Scott Haymore
Also filed as: HAYMORE SCOTT
10 granted patents·6 pending applications·5 citations·filing 2016–2024
79Inventor score
Top patents by PatentIndex Score
16 records- 0181US11913109B2Apparatus and a method of controlling thickness variation in a material layer formed using physical vapour depositionSPTS TECHNOLOGIES LTD·Filed 2019·Granted Feb 27, 2024·1 cites·6 claims
- 0278US10900114B2Method and apparatus for depositing a materialSPTS TECHNOLOGIES LTD·Filed 2016·Granted Jan 26, 2021·3 cites·18 claims
- 0377US2024014018A1Apparatus and a Method of Controlling Thickness Variation in a Material Layer Formed Using Physical Vapour DepositionSPTS TECHNOLOGIES LTD·Filed 2023·Application pending·0 cites
- 0474US10601388B2Method of depositionSPTS TECHNOLOGIES LTD·Filed 2016·Granted Mar 24, 2020·1 cites·17 claims
- 0569US11718908B2DC magnetron sputteringSPTS TECHNOLOGIES LTD·Filed 2021·Granted Aug 8, 2023·0 cites·14 claims
- 0666US11961722B2Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor depositionSPTS TECHNOLOGIES LTD·Filed 2022·Granted Apr 16, 2024·0 cites·17 claims
- 0766US2025354801A1In-situ wafer stress measurement by chromatic confocal sensor scanning with temperature compensationORBOTECH LTD·Filed 2024·Application pending·0 cites
- 0866US2025354803A1In-situ wafer stress measurement by chromatic confocal sensor scanning with vibration compensationORBOTECH LTD·Filed 2024·Application pending·0 cites
- 0957US11875980B2Method and apparatus for depositing a materialSPTS TECHNOLOGIES LTD·Filed 2020·Granted Jan 16, 2024·0 cites·9 claims
- 1053US2024177997A1Method of Operating a PVD ApparatusSPTS TECHNOLOGIES LTD·Filed 2023·Application pending·0 cites
- 1151US12043891B2Deposition method of a metallic layer on a substrate of a resonator deviceSPTS TECHNOLOGIES LTD·Filed 2021·Granted Jul 23, 2024·0 cites·18 claims
- 1251US2022085275A1Deposition MethodSPTS TECHNOLOGIES LTD·Filed 2021·Application pending·0 cites
- 1349US11521840B2Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor depositionSPTS TECHNOLOGIES LTD·Filed 2018·Granted Dec 6, 2022·0 cites·7 claims
- 1449US11008651B2DC magnetron sputteringSPTS TECHNOLOGIES LTD·Filed 2017·Granted May 18, 2021·0 cites·9 claims
- 1549US2023136705A1PVD Method and ApparatusSPTS TECHNOLOGIES LTD·Filed 2022·Application pending·0 cites
- 1639US12207556B2Method of depositionSPTS TECHNOLOGIES LTD·Filed 2020·Granted Jan 21, 2025·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →