Inventor · disambiguated record
Seong-Woon Choi
Also filed as: CHOI SEONG-WOON
28 granted patents·11 pending applications·222 citations·filing 2002–2015
96Inventor score
Top patents by PatentIndex Score
39 records- 0198US8039196B2Method of forming fine patterns using a block copolymerSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Oct 18, 2011·76 cites·20 claims
- 0287US8338310B2Method of forming line/space patternsJUNG SUNG-GON·Filed 2010·Granted Dec 25, 2012·11 cites·16 claims
- 0386US8399174B2Method of forming fine patterns using a block copolymerKIM KYOUNG TAEK·Filed 2011·Granted Mar 19, 2013·8 cites·20 claims
- 0486US7001697B2Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Feb 21, 2006·41 cites·36 claims
- 0581US8392854B2Method of manufacturing semiconductor device by using uniform optical proximity correctionKIM SANG-WOOK·Filed 2011·Granted Mar 5, 2013·8 cites·20 claims
- 0680US8173358B2Method of forming fine patterns of a semiconductor deviceKIM HYOUNG-HEE·Filed 2009·Granted May 8, 2012·9 cites·20 claims
- 0780US7560198B2Photo-mask having exposure blocking region and methods of designing and fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jul 14, 2009·6 cites·37 claims
- 0878US6835507B2Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flareSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Dec 28, 2004·19 cites·21 claims
- 0976US7527901B2Method of repairing phase shift maskSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted May 5, 2009·5 cites·18 claims
- 1076US7389491B2Methods, systems and computer program products for correcting photomask using aerial images and boundary regionsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 17, 2008·5 cites·19 claims
- 1169US8263487B2Method of forming patterns of semiconductor deviceYOON DONG-KI·Filed 2009·Granted Sep 11, 2012·3 cites·9 claims
- 1269US7521156B2Photo mask and method of correcting the transmissivity of a photo maskSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Apr 21, 2009·3 cites·14 claims
- 1368US8227349B2Method of forming a mask pattern, method of forming a minute pattern, and method of manufacturing a semiconductor device using the sameKIM HYOUNG-HEE·Filed 2010·Granted Jul 24, 2012·3 cites·20 claims
- 1466US8510684B2Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effectJEONG MOON-GYU·Filed 2011·Granted Aug 13, 2013·2 cites·18 claims
- 1566US7601467B2Method of manufacturing EUVL alternating phase-shift maskSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 13, 2009·2 cites·18 claims
- 1664US8341561B2Methods of arranging mask patterns and associated apparatusPARK DONG-WOON·Filed 2010·Granted Dec 25, 2012·1 cites·18 claims
- 1764US6866968B2Photomask for off-axis illumination and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Mar 15, 2005·9 cites·30 claims
- 1858US8689150B2Method of fabricating semiconductor deviceJUNG JEE-EUN·Filed 2012·Granted Apr 1, 2014·1 cites·19 claims
- 1957US7369254B2System and method for measuring dimension of patterns formed on photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted May 6, 2008·3 cites·17 claims
- 2054US7736838B2Methods for forming pattern using electron beam and cell masks used in electron beam lithographySAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jun 15, 2010·0 cites·16 claims
- 2152US7939223B2Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the methodSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted May 10, 2011·0 cites·17 claims
- 2251US7465524B2Photomask and method of controlling transmittance and phase of light using the photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Dec 16, 2008·2 cites·19 claims
- 2349US2011244376A1Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the methodSAMSUNG ELECTRONICS CO LTD·Filed 2011·Application pending·0 cites
- 2447US7393615B2Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flareSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jul 1, 2008·2 cites·7 claims
- 2547US7341809B2Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operationSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Mar 11, 2008·0 cites·14 claims
- 2646US7065735B2Method for making an OPC mask and an OPC mask manufactured using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 20, 2006·1 cites·22 claims
- 2746US2009059197A1Exposure apparatus and method of exposing a semiconductor substrateNAM DONG-SEOK·Filed 2008·Application pending·0 cites
- 2845US8536347B2Photoacid generator, chemically amplified resist composition including the same, and associated methodsKANG YOOL·Filed 2008·Granted Sep 17, 2013·0 cites·9 claims
- 2945US7070891B2Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operationSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jul 4, 2006·2 cites·17 claims
- 3044US2008062397A1Photolithography Apparatus Having Mirror for Correcting Aberrations in Optical Illumination System and Mirror Having Aberration Correcting PartNAM DONG-SEOK·Filed 2007·Application pending·0 cites
- 3143US2007111112A1Systems and methods for fabricating photo masksSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3242US2006177745A1Phase shift masksSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3342US2006269118A1Method of inspecting defects in photomask having a plurality of dies with different transmittancesSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3438US2011224945A1Method of performing etch proximity correction, method of forming photomask layout using the method, computer-readable recording medium storing programmed instructions for executing the method, and mask imaging systemSAMSUNG ELECTRONICS CO LTD·Filed 2011·Application pending·0 cites
- 3537US2005140988A1Optical critical dimension measurement equipmentFiled 2004·Application pending·0 cites
- 3636US2011244689A1Method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2011·Application pending·0 cites
- 3736US2011029936A1Method of generating layout of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2010·Application pending·0 cites
- 3836US2016216602A1Mask and manufacturing method for liquid crystal display using the sameSAMSUNG DISPLAY CO LTD·Filed 2015·Application pending·0 cites
- 3935US8484584B2Systems, methods and computer program products for forming photomasks with reduced likelihood of feature collapse, and photomasks so formedLEE MI-KYEONG·Filed 2011·Granted Jul 9, 2013·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →