Inventor · disambiguated record
Sergiy Yakovlevich Navala
Also filed as: NAVALA SERGIY Y · NAVALA SERGIY YAKOVLEVICH
4 granted patents·2 pending applications·269 citations·filing 2002–2004
79Inventor score
Files withSAMSUNG ELECTRONICS CO LTD6
Top patents by PatentIndex Score
6 records- 0196US7252716B2Gas injection apparatus for semiconductor processing systemSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Aug 7, 2007·234 cites·20 claims
- 0283US7210424B2High-density plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 1, 2007·21 cites·17 claims
- 0374US7404879B2Ionized physical vapor deposition apparatus using helical self-resonant coilSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jul 29, 2008·11 cites·34 claims
- 0458US7052583B2Magnetron cathode and magnetron sputtering apparatus comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 30, 2006·3 cites·17 claims
- 0539US2005173069A1Plasma generating apparatus and plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 0637US2004094412A1Magnetron sputtering apparatus and magnetron sputtering method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →