Inventor · disambiguated record
Seiji Noda
Also filed as: NODA SEIJI
14 granted patents·11 pending applications·126 citations·filing 2000–2022
91Inventor score
Files withMITSUBISHI ELECTRIC CORP21FURUKAWA SEIJI1SHIMADA RIKA KOGYO KK1SHIMADA RIKA KOUGYO KABUSHIKI1
Top patents by PatentIndex Score
25 records- 0189US6616773B1Substrate treatment methodMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Sep 9, 2003·47 cites·12 claims
- 0284US6517998B1Method for removing photoresist film and apparatus used thereforMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Feb 11, 2003·21 cites·4 claims
- 0380US10961135B2Water treatment apparatus and water treatment methodMITSUBISHI ELECTRIC CORP·Filed 2019·Granted Mar 30, 2021·1 cites·17 claims
- 0478US9845961B2Humidifier and method of hydrophilization processing for humidifying materialMITSUBISHI ELECTRIC CORP·Filed 2013·Granted Dec 19, 2017·6 cites·11 claims
- 0578US8840785B2Scale deposition device and water heaterFURUKAWA SEIJI·Filed 2010·Granted Sep 23, 2014·4 cites·7 claims
- 0677US11667551B2Water treatment device, water treatment system, method of assembling water treatment device, and water treatment methodMITSUBISHI ELECTRIC CORP·Filed 2018·Granted Jun 6, 2023·1 cites·27 claims
- 0773US6715944B2Apparatus for removing photoresist filmMITSUBISHI ELECTRIC CORP·Filed 2002·Granted Apr 6, 2004·16 cites·6 claims
- 0872US6517999B1Method of removing photoresist filmSHIMADA RIKA KOUGYO KABUSHIKI·Filed 2000·Granted Feb 11, 2003·20 cites·9 claims
- 0960US6955178B1Substrate treatment apparatusMITSUBISHI ELECTRIC CORP·Filed 2003·Granted Oct 18, 2005·6 cites·8 claims
- 1060US2019322552A1Water treatment apparatus and water treatment methodMITSUBISHI ELECTRIC CORP·Filed 2017·Application pending·0 cites
- 1159US10197293B2Scale trapping unit and water heaterMITSUBISHI ELECTRIC CORP·Filed 2014·Granted Feb 5, 2019·0 cites·10 claims
- 1258US7965372B2Apparatus for removing photoresist filmMITSUBISHI ELECTRIC CORP·Filed 2002·Granted Jun 21, 2011·4 cites·15 claims
- 1354US2025109050A1Water treatment system, aeration amount control device, and aeration amount control methodMITSUBISHI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 1453US12195369B2Water treatment deviceMITSUBISHI ELECTRIC CORP·Filed 2019·Granted Jan 14, 2025·0 cites·14 claims
- 1552US12037273B2Ion removal apparatusMITSUBISHI ELECTRIC CORP·Filed 2021·Granted Jul 16, 2024·0 cites·8 claims
- 1647US2021053014A1Membrane cleaning device and membrane cleaning methodMITSUBISHI ELECTRIC CORP·Filed 2018·Application pending·0 cites
- 1746US2020001240A1Membrane separation device and membrane separation methodMITSUBISHI ELECTRIC CORP·Filed 2017·Application pending·0 cites
- 1846US2022219123A1Filtration membrane treatment device, membrane filtration device, and filtration membrane treatment methodMITSUBISHI ELECTRIC CORP·Filed 2018·Application pending·0 cites
- 1945US2006289362A1Water treatment method and water treatment apparatusMITSUBISHI ELECTRIC CORP·Filed 2006·Application pending·0 cites
- 2042US2025113145A1Sound environment control system and sound environment control methodMITSUBISHI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 2141US2021214250A1Ozone water generation device, water treatment device, ozone water generation method, and cleaning methodMITSUBISHI ELECTRIC CORP·Filed 2018·Application pending·0 cites
- 2239US12099926B2Water treatment plant and method for operating water treatment plantMITSUBISHI ELECTRIC CORP·Filed 2018·Granted Sep 24, 2024·0 cites·12 claims
- 2339US2020339444A1Aeration amount control system and aeration amount control methodMITSUBISHI ELECTRIC CORP·Filed 2018·Application pending·0 cites
- 2438US2007006904A1Substrate cleaning system and substrate cleaning methodSHIMADA RIKA KOGYO KK·Filed 2006·Application pending·0 cites
- 2534US2003066549A1Substrate processing method, and apparatus thereforFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →