Inventor · disambiguated record
Seok-Bong Park
Also filed as: PARK SEOK-BONG
6 granted patents·5 pending applications·11 citations·filing 2004–2020
73Inventor score
Files withROHM & HAAS ELECT MATERIALS KOREA LTD6SAMSUNG ELECTRONICS CO LTD2KIM MYUNGSUN1OSSEIN CO LTD1PARK SEOK-BONG1
Top patents by PatentIndex Score
11 records- 0180US10884335B2Black photosensitive resin composition and black column spacer prepared therefromROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2016·Granted Jan 5, 2021·2 cites·5 claims
- 0279US10534261B2Colored photosensitive resin composition and light shielding spacer prepared therefromROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2017·Granted Jan 14, 2020·2 cites·9 claims
- 0363US7528188B2Resin solution and method of forming a protection layerSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 5, 2009·7 cites·24 claims
- 0453US10859907B2Method for preparing column spacerROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2016·Granted Dec 8, 2020·0 cites·3 claims
- 0551US2020299236A1Colored photosensitive resin composition and light shielding spacer prepared therefromROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2020·Application pending·0 cites
- 0644US2006186086A1Composition for forming a polymer layer and method of forming a pattern using the sameKIM MYUNGSUN·Filed 2006·Application pending·0 cites
- 0743US2018305313A1Colored photosensitive resin composition and light shielding spacer prepared therefromROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2016·Application pending·0 cites
- 0840US10656520B2Photosensitive resin composition and cured film prepared therefromROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2016·Granted May 19, 2020·0 cites·6 claims
- 0937US7026240B2Method of fabricating a semiconductor device having a photo-sensitive polyimide layer and a device fabricated in accordance with the methodSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Apr 11, 2006·0 cites·24 claims
- 1036US2017065740A1High strength synthetic bone for bone replacement for increasing ompressive strength and facilitating blood circulation, and manufacturing method thereforOSSEIN CO LTD·Filed 2014·Application pending·0 cites
- 1135US2006154176A1Photoresist composition, method of forming a photoresist pattern and method of forming a protection layer in a semiconductor device using the photoresist compositionPARK SEOK-BONG·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →