Inventor · disambiguated record
Seiji Tono
Also filed as: TONO SEIJI
8 granted patents·11 pending applications·14 citations·filing 2001–2025
77Inventor score
Top patents by PatentIndex Score
19 records- 0179US11390829B2Treatment liquid for semiconductor wafers, which contains hypochlorite ionsTOKUYAMA CORP·Filed 2019·Granted Jul 19, 2022·2 cites·15 claims
- 0277US2024228428A1Method for producing organic solvent solution of quaternary ammonium hydroxideTOKUYAMA CORP·Filed 2024·Application pending·0 cites
- 0372US2025257264A1Semiconductor wafer treatment liquid containing hypochlorite ions and ph bufferTOKUYAMA CORP·Filed 2025·Application pending·0 cites
- 0471US12269980B2Silicon etching solution and method for producing silicon device using the etching solutionTOKUYAMA CORP·Filed 2022·Granted Apr 8, 2025·0 cites·7 claims
- 0566US6949495B2Cleaning solution for removing residueTOKUYAMA CORP·Filed 2001·Granted Sep 27, 2005·12 cites·4 claims
- 0664US2022325205A1Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlorite IonsTOKUYAMA CORP·Filed 2022·Application pending·0 cites
- 0764US2022033343A1Method for producing organic solvent solution of quaternary ammonium hydroxideTOKUYAMA CORP·Filed 2019·Application pending·0 cites
- 0861US11466206B2Silicon etching solution and method for producing silicon device using the etching solutionTOKUYAMA CORP·Filed 2020·Granted Oct 11, 2022·0 cites·8 claims
- 0956US2022010206A1Semiconductor wafer treatment liquid containing hypochlorite ions and ph bufferTOKUYAMA CORP·Filed 2020·Application pending·0 cites
- 1053US11572533B2Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor waferTOKUYAMA CORP·Filed 2019·Granted Feb 7, 2023·0 cites·18 claims
- 1148US12466999B2Silicon etching liquid, and method for producing silicon device and method for processing silicon substrate, each using said etching liquidTOKUYAMA CORP·Filed 2021·Granted Nov 11, 2025·0 cites·6 claims
- 1247US2023136986A1Silicon etching liquid containing aromatic aldehydeTOKUYAMA CORP·Filed 2022·Application pending·0 cites
- 1344US2024124775A1Silicon etching liquid, and method for producing silicon devices and method for processing substrates, each using said etching liquidTOKUYAMA CORP·Filed 2021·Application pending·0 cites
- 1443US2021269716A1Silicon Etching Solution, Method for Manufacturing Silicon Device Using Same, and Substrate Treatment MethodTOKUYAMA CORP·Filed 2021·Application pending·0 cites
- 1542US2023287270A1Silicon etching liquid, and method for producing silicon device and method for processing silicon substrate, each using said etching liquidTOKUYAMA CORP·Filed 2021·Application pending·0 cites
- 1642US2024112917A1Method for processing substrate, and method for manufacturing silicon device comprising said processing methodTOKUYAMA CORP·Filed 2022·Application pending·0 cites
- 1738US2022041931A1Silicon Etching LiquidTOKUYAMA CORP·Filed 2019·Application pending·0 cites
- 1826US8808976B2Photoresist developer and method for fabricating substrate by using the developer thereofOMAE SHUNKICHI·Filed 2006·Granted Aug 19, 2014·0 cites·10 claims
- 1920US8703402B2Resist pattern forming method and developerTONO SEIJI·Filed 2010·Granted Apr 22, 2014·0 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →