Inventor · disambiguated record
Shingo Asaumi
Also filed as: ASAUMI SHINGO · OKAZAKI NOBORU
12 granted patents·421 citations·filing 1978–1992
93Inventor score
Files withTOKYO OHKA KOGYO CO LTD12
Top patents by PatentIndex Score
12 records- 0196US4385086AMethod for preventing leaching of contaminants from solid surfacesTOKYO OHKA KOGYO CO LTD·Filed 1979·Granted May 24, 1983·75 cites·8 claims
- 0293US4833067ADeveloping solution for positive-working photoresist comprising tmah and non-ionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted May 23, 1989·75 cites·1 claims
- 0389US4824762AMethod for rinse treatment of a substrateTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Apr 25, 1989·55 cites·6 claims
- 0487US4731319APositive-working naphthoquinone diazide photoresist composition with two cresol novolac resinsTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Mar 15, 1988·48 cites·2 claims
- 0583US4784937ADeveloping solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Nov 15, 1988·35 cites·2 claims
- 0680US4844832AContaining an arylsulfonic acid, a phenol and a naphalenic solventTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Jul 4, 1989·31 cites·7 claims
- 0780US4738915APositive-working O-quinone diazide photoresist composition with 2,3,4-trihydroxybenzophenoneTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Apr 19, 1988·31 cites·6 claims
- 0868US4882260APositive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dyeTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Nov 21, 1989·19 cites·5 claims
- 0967US4906549APositive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atomsTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Mar 6, 1990·15 cites·5 claims
- 1066US4804612AHighly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturationTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Feb 14, 1989·17 cites·9 claims
- 1165US4174222APositive-type O-quinone diazide containing photoresist compositionsTOKYO OHKA KOGYO CO LTD·Filed 1978·Granted Nov 13, 1979·16 cites·8 claims
- 1238US5281508APositive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresolTOKYO OHKA KOGYO CO LTD·Filed 1992·Granted Jan 25, 1994·4 cites·3 claims
Join the waitlist — get patent alerts
Get an alert when Shingo Asaumi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →