Inventor · disambiguated record
Shinhyo Bae
Also filed as: BAE SHINHYO
10 granted patents·5 pending applications·3 citations·filing 2017–2025
78Inventor score
Files withSAMSUNG SDI CO LTD15
Top patents by PatentIndex Score
15 records- 0189US11249396B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2020·Granted Feb 15, 2022·2 cites·19 claims
- 0278US12313974B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2023·Granted May 27, 2025·0 cites·8 claims
- 0370US11982943B2Method of forming patterns using resist underlayer compositionSAMSUNG SDI CO LTD·Filed 2022·Granted May 14, 2024·0 cites·15 claims
- 0465US11675271B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted Jun 13, 2023·0 cites·8 claims
- 0565US10732504B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Aug 4, 2020·1 cites·10 claims
- 0662US2024319605A1Hardmask composition, hardmask layer and method of forming patternsSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0759US11385545B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2019·Granted Jul 12, 2022·0 cites·14 claims
- 0852US11698587B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2019·Granted Jul 11, 2023·0 cites·11 claims
- 0951US2023288809A1Composition for resist underlayer and pattern formation method using sameSAMSUNG SDI CO LTD·Filed 2021·Application pending·0 cites
- 1050US12130552B2Composition for resist underlayer, and pattern forming method using sameSAMSUNG SDI CO LTD·Filed 2020·Granted Oct 29, 2024·0 cites·14 claims
- 1149US11987561B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2021·Granted May 21, 2024·0 cites·17 claims
- 1248US2023026579A1Method for forming photoresist patternsSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 1347US2025291241A1Hardmask composition, hardmask layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2025·Application pending·0 cites
- 1437US11493848B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Nov 8, 2022·0 cites·17 claims
- 1532US2019317403A1Organic layer composition, organic layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →