Inventor · disambiguated record
Shu-Han Chen
Also filed as: CHEN SHU · CHEN SHU-HAN
32 granted patents·32 pending applications·19 citations·filing 2007–2025
94Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD50CHEN SHU-HAN5SHURCON MFG INC2ZHEJIANG SHURCON MFG CO LTD2ABILITY OPTO ELECTRONICS TECHNOLOGY CO LTD1
Top patents by PatentIndex Score
64 records- 0193US11430865B2Semiconductor device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 30, 2022·3 cites·20 claims
- 0289US2025357128A1Methods of forming semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0388US2025343045A1Replacement Gate Methods That Include Treating Spacers to Widen GateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0486US9773889B2Method of semiconductor arrangement formationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 26, 2017·5 cites·20 claims
- 0585US12456623B2Replacement gate methods that include treating spacers to widen gateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Oct 28, 2025·0 cites·20 claims
- 0683US12278267B2Semiconductor devices having funnel-shaped gate structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Apr 15, 2025·0 cites·20 claims
- 0782US12303080B2Manufacturing method and manufacturing equipment for corrugated netChen shu han·Filed 2024·Granted May 20, 2025·0 cites·6 claims
- 0882US11398384B2Methods for manufacturing a transistor gate by non-directional implantation of impurities in a gate spacerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 26, 2022·1 cites·20 claims
- 0982US10263097B2Method of semiconductor arrangement formationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 16, 2019·2 cites·20 claims
- 1082US9209066B2Isolation structure of semiconductor deviceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Dec 8, 2015·4 cites·20 claims
- 1182US2024379364A1Semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1282US2025331240A1Semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1381US2025366181A1Semiconductor device structure and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1480US2025359164A1Gate dielectric layers for stacked multi-gate deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1580US2025359121A1Dielectric layer for nanosheet protection and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1679US2025374606A1Source/drain dielectric structure and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1779US2025366127A1Semiconductor Structure With Modified Spacer And Method For Forming The SameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1879US2025344429A1Semiconductor device with metal gate structure and fabrication method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1978US12444608B2Structure having gate spacers with projecting portions extending into a gate dielectricTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 14, 2025·0 cites·20 claims
- 2078US12376344B2Semiconductor device comprising channel layers with different thicknessesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 29, 2025·0 cites·20 claims
- 2178US2025142900A1Gate oxide of nanostructure transistor with increased corner thicknessTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2278US2025344463A1Semiconductor Device Structure and Method for Forming the SameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2377US11069531B2Replacement gate methods that include treating spacers to widen gateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 20, 2021·1 cites·20 claims
- 2476US12218197B2Gate oxide of nanostructure transistor with increased corner thicknessTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 4, 2025·0 cites·20 claims
- 2576US11990509B2Semiconductor devices having gate structures with slanted sidewallsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 21, 2024·0 cites·20 claims
- 2675US2025364254A1Method of manufacturing semiconductor devices and semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2775US2025248086A1Semiconductor devices having funnel-shaped gate structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2874US11908695B2Replacement gate methods that include treating spacers to widen gateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 20, 2024·0 cites·20 claims
- 2974US2025351507A1Semiconductor devices and methods of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3073US2025275208A1NON-CONFORMAL GATE OXIDE FORMATION ON FinFETTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3172US12264435B2Pulp molding production line and processing method thereofSHURCON MFG INC·Filed 2022·Granted Apr 1, 2025·0 cites·13 claims
- 3272US2025344476A1Selective deposition of mask for reducing nano sheet lossTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3371US2025254938A1Nanostructure field-effect transistor device and methods of formingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3470US2025048725A1Semiconductor device structure and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3570US2025006829A1Semiconductor device with metal gate structure and fabrication method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3669US12059107B2Manufacturing method and manufacturing equipment for corrugated netChen shu han·Filed 2021·Granted Aug 13, 2024·0 cites·6 claims
- 3768US11942556B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 26, 2024·0 cites·20 claims
- 3868US2025126840A1Source/drain dielectric structure and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3968US2024313076A1Gate dielectric layers for stacked multi-gate deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4067US12336248B2Non-conformal gate oxide formation on FinFETTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 17, 2025·0 cites·20 claims
- 4167US11855140B2Gate oxide of nanostructure transistor with increased corner thicknessTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 26, 2023·0 cites·20 claims
- 4267US7886394B2Bath utilityCHEN SHU-HAN·Filed 2007·Granted Feb 15, 2011·3 cites·16 claims
- 4367US2023187535A1Semiconductor structure with modified spacer and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 4466US2025048703A1Semiconductor devices and methods of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4565US12084812B2Pulp molding production line and processing methodZHEJIANG SHURCON MFG CO LTD·Filed 2019·Granted Sep 10, 2024·0 cites·13 claims
- 4664US11177368B2Semiconductor arrangementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Nov 16, 2021·0 cites·20 claims
- 4764US2025089330A1Selective deposition of mask for reducing nano sheet lossTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4863US12310074B2NanoStructure field-effect transistor device and methods of formingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 20, 2025·0 cites·20 claims
- 4962US12506007B2Method of manufacturing semiconductor devices and semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Dec 23, 2025·0 cites·20 claims
- 5061US2025385098A1Semiconductor device with metal gate structure and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
Showing the top 50 of 64 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →