Inventor · disambiguated record
Shun-Tong Chen
Also filed as: CHEN SHUN-TONG
5 granted patents·7 pending applications·0 citations·filing 2014–2025
58Inventor score
Files withUNIV NAT TAIWAN NORMAL12
Top patents by PatentIndex Score
12 records- 0164US2025154678A1Jerk electrolytic processing apparatusUNIV NAT TAIWAN NORMAL·Filed 2024·Application pending·0 cites
- 0254US2025196243A1Electrical discharge machining equipment and method with equal-energy densityUNIV NAT TAIWAN NORMAL·Filed 2024·Application pending·0 cites
- 0353US12403496B2Co-axial roller printing equipment and method thereofUNIV NAT TAIWAN NORMAL·Filed 2022·Granted Sep 2, 2025·0 cites·7 claims
- 0452US2025345871A1Electrical discharge machining equipment and method with equidistantly triggering dischargeUNIV NAT TAIWAN NORMAL·Filed 2025·Application pending·0 cites
- 0551US2025083241A1Double resistor-capacitor discharge machining systemUNIV NAT TAIWAN NORMAL·Filed 2024·Application pending·0 cites
- 0649US10288146B2Dual eccentric shaft driving mechanismUNIV NAT TAIWAN NORMAL·Filed 2018·Granted May 14, 2019·0 cites·6 claims
- 0746US9950377B2Plural resistance-capacitance (PRC) electrical discharge machining systemUNIV NAT TAIWAN NORMAL·Filed 2014·Granted Apr 24, 2018·0 cites·9 claims
- 0845US11413676B2Electromagnetic stamping apparatusUNIV NAT TAIWAN NORMAL·Filed 2020·Granted Aug 16, 2022·0 cites·9 claims
- 0941US10857609B2Non-contact wire array tension control deviceUNIV NAT TAIWAN NORMAL·Filed 2018·Granted Dec 8, 2020·0 cites·9 claims
- 1041US2021354221A1Electrolytic processing apparatus and method thereofUNIV NAT TAIWAN NORMAL·Filed 2020·Application pending·0 cites
- 1138US2019300324A1Fluid-controlled wire tension mechanismUNIV NAT TAIWAN NORMAL·Filed 2018·Application pending·0 cites
- 1236US2021146502A1In-situ spark erosion dressing system and method thereofUNIV NAT TAIWAN NORMAL·Filed 2020·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Shun-Tong Chen files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →