Inventor · disambiguated record
Shang-Chieh Chien
Also filed as: CHIEN SHANG-CHIEH
168 granted patents·42 pending applications·565 citations·filing 2009–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD203LUXVISIONS INNOVATION LTD2TAIWAN SEMICONDUCTOR MFG2CHEN YU-CHIH1CHUNGHWA PICTURE TUBES LTD1
Top patents by PatentIndex Score
210 records- 0198US9256123B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Feb 9, 2016·365 cites·20 claims
- 0297US12007694B2Lithography apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 11, 2024·4 cites·20 claims
- 0397US11693326B1System and method for dynamically controlling temperature of thermostatic reticlesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 4, 2023·7 cites·20 claims
- 0497US11693324B2System and method for detecting debris in a photolithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 4, 2023·3 cites·20 claims
- 0597US11275317B1Droplet generator and method of servicing a photolithographic toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 15, 2022·3 cites·20 claims
- 0697US10656539B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 19, 2020·7 cites·20 claims
- 0797US10459352B2Mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 29, 2019·10 cites·20 claims
- 0897US10314154B1System and method for extreme ultraviolet source controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 4, 2019·13 cites·20 claims
- 0997US10274844B1Lithography apparatus and method for protecting a reticleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·13 cites·20 claims
- 1096US12085585B2Particle image velocimetry of extreme ultraviolet lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 10, 2024·2 cites·20 claims
- 1196US12019378B2Methods of cleaning a lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 25, 2024·2 cites·20 claims
- 1296US11392040B2System and method for performing extreme ultraviolet photolithography processesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 19, 2022·4 cites·20 claims
- 1396US11029324B2Particle image velocimetry of extreme ultraviolet lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 8, 2021·7 cites·20 claims
- 1495US12061423B2Method and apparatus for mitigating tin debrisTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 13, 2024·2 cites·20 claims
- 1595US12055864B2Droplet generator and method of servicing a photolithographic toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 6, 2024·2 cites·20 claims
- 1695US11680958B2Particle image velocimetry of extreme ultraviolet lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 20, 2023·3 cites·6 claims
- 1795US10928741B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 23, 2021·3 cites·20 claims
- 1894US11768437B2System and method for performing extreme ultraviolet photolithography processesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 26, 2023·2 cites·20 claims
- 1994US11747741B2Substrate stage, substrate processing system using the same, and method for processing substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 5, 2023·2 cites·20 claims
- 2094US11662668B2Lithography contamination controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 30, 2023·2 cites·20 claims
- 2194US11553581B2Radiation source apparatus and method for using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 10, 2023·2 cites·20 claims
- 2294US11437161B1Lithography apparatus and method for using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 6, 2022·2 cites·20 claims
- 2394US11392041B2Particle removal device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 19, 2022·2 cites·20 claims
- 2494US10875060B2Method and apparatus for removing debris from collectorTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 29, 2020·8 cites·20 claims
- 2593US11809083B2EUV photolithography system fuel source and methods of operating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 7, 2023·2 cites·20 claims
- 2693US11533799B1System and method for supplying target material in an EUV light sourceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 20, 2022·2 cites·20 claims
- 2793US11275318B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 15, 2022·2 cites·20 claims
- 2892US12085865B2System and method for detecting debris in a photolithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 10, 2024·1 cites·20 claims
- 2992US12078933B2System and method for omnidirectional real time detection of photolithography characteristicsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 3, 2024·2 cites·20 claims
- 3092US2025362594A1Lithography system and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3191US11832372B2EUV light source and apparatus for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 28, 2023·1 cites·20 claims
- 3291US10718718B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 21, 2020·4 cites·20 claims
- 3391US10512147B1Extreme ultraviolet radiation source and droplet catcher thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 17, 2019·4 cites·20 claims
- 3490US10880981B2Collector pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 29, 2020·4 cites·20 claims
- 3590US10678138B2Extreme ultraviolet (EUV) radiation source and a method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 9, 2020·4 cites·20 claims
- 3690US10459353B2Lithography system with an embedded cleaning moduleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Oct 29, 2019·5 cites·20 claims
- 3789US11841625B2Device and method to remove debris from an extreme ultraviolet (EUV) lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 12, 2023·1 cites·20 claims
- 3889US2025362616A1Inspection tool for a semiconductor processing tool and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3988US12372887B2Methods of cleaning a lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 29, 2025·0 cites·20 claims
- 4088US11822259B2Acoustic particle deflection in lithography toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 21, 2023·1 cites·20 claims
- 4188US11675272B2Method and apparatus for mitigating contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 13, 2023·1 cites·20 claims
- 4288US10162277B2Extreme ultraviolet lithography system with debris trapper on exhaust lineTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 25, 2018·5 cites·20 claims
- 4388US9664999B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 30, 2017·2 cites·20 claims
- 4487US12066761B2Inspection tool for an extreme ultraviolet radiation source to observe tin residualTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 20, 2024·1 cites·20 claims
- 4587US11605477B1EUV lithography apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 14, 2023·1 cites·20 claims
- 4687US10429314B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 1, 2019·3 cites·20 claims
- 4787US2025334606A1Particle image velocimetry of extreme ultraviolet lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4887US2025362615A1Lithography system and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4986US12436164B2Particle image velocimetry of extreme ultraviolet lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Oct 7, 2025·0 cites·20 claims
- 5086US12405541B2Methods of servicing photolithographic apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Sep 2, 2025·0 cites·20 claims
Showing the top 50 of 210 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →