Inventor · disambiguated record
Sheng-Chi Chin
Also filed as: CHIN SHENG-CHI
45 granted patents·4 pending applications·348 citations·filing 1999–2024
97Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD21TAIWAN SEMICONDUCTOR MFG17CHANG SHIH-MING2LU CHI-LUN2CHEN CHIA-JEN1
Top patents by PatentIndex Score
49 records- 0198US8709682B2Mask and method for forming the maskCHEN CHIA-JEN·Filed 2012·Granted Apr 29, 2014·82 cites·20 claims
- 0297US8691476B2EUV mask and method for forming the sameYU CHING-FANG·Filed 2011·Granted Apr 8, 2014·128 cites·20 claims
- 0395US7383530B2System and method for examining mask pattern fidelityTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jun 3, 2008·27 cites·12 claims
- 0494US9835940B2Method to fabricate mask-pellicle systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Dec 5, 2017·5 cites·20 claims
- 0591US9658526B2Mask pellicle indicator for haze preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted May 23, 2017·9 cites·20 claims
- 0690US8227150B2Holographic reticle and patterning methodCHANG SHIH-MING·Filed 2010·Granted Jul 24, 2012·6 cites·20 claims
- 0786US9933699B2Pellicle aging estimation and particle removal from pellicle via acoustic wavesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 3, 2018·3 cites·20 claims
- 0886US2024377364A1Acoustic Measurement of Fabrication Equipment ClearanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0985US9354510B2EUV mask and method for forming the sameTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted May 31, 2016·3 cites·20 claims
- 1083US12320782B2Acoustic measurement of fabrication equipment clearanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jun 3, 2025·0 cites·15 claims
- 1183US10126644B2Pellicle for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 13, 2018·2 cites·20 claims
- 1283US6599665B1Method of making a semiconductor wafer imaging mask having uniform pattern featuresTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Jul 29, 2003·22 cites·8 claims
- 1378US10061193B2Focused radiation beam induced depositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 28, 2018·2 cites·20 claims
- 1478US6428938B1Phase-shift mask for printing high-resolution images and a method of fabricationTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Aug 6, 2002·17 cites·18 claims
- 1576US6830853B1Chrome mask dry etching process to reduce loading effect and defectsTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Dec 14, 2004·18 cites·20 claims
- 1673US11709153B2Acoustic measurement of fabrication equipment clearanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 25, 2023·0 cites·20 claims
- 1772US10520805B2System and method for localized EUV pellicle glue removalTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 31, 2019·1 cites·20 claims
- 1872US9418847B2Lithography system and method for haze eliminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 16, 2016·2 cites·20 claims
- 1970US12429776B2Lithography method with reduced impacts of mask defectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 30, 2025·0 cites·20 claims
- 2070US8758963B2Holographic reticle and patterning methodCHANG SHIH-MING·Filed 2012·Granted Jun 24, 2014·1 cites·20 claims
- 2169US9889477B2Method and apparatus for enhanced cleaning and inspectionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Feb 13, 2018·1 cites·20 claims
- 2269US9152035B2Lithographic photomask with inclined sidesTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Oct 6, 2015·1 cites·20 claims
- 2364US8737717B2Method and apparatus for defect identificationLIN MEI-CHUN·Filed 2012·Granted May 27, 2014·3 cites·20 claims
- 2463US11079669B2System and method for localized EUV pellicle glue removalTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 3, 2021·0 cites·20 claims
- 2563US10691017B2Pellicle for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 23, 2020·0 cites·20 claims
- 2663US7999910B2System and method for manufacturing a mask for semiconductor processingTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Aug 16, 2011·1 cites·16 claims
- 2763US7697114B2Method and apparatus for compensated illumination for advanced lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Apr 13, 2010·1 cites·26 claims
- 2862US10845342B2Acoustic measurement of film thicknessTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 24, 2020·0 cites·20 claims
- 2961US10859908B2Method to fabricate mask-pellicle systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 8, 2020·0 cites·20 claims
- 3059US10955746B2Lithography method with reduced impacts of mask defectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Mar 23, 2021·0 cites·20 claims
- 3158US7722997B2Holographic reticle and patterning methodTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted May 25, 2010·0 cites·13 claims
- 3257US7312021B2Holographic reticle and patterning methodTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Dec 25, 2007·3 cites·15 claims
- 3357US7060400B2Method to improve photomask critical dimension uniformity and photomask fabrication processTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jun 13, 2006·5 cites·26 claims
- 3456US10794872B2Acoustic measurement of fabrication equipment clearanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 6, 2020·0 cites·20 claims
- 3555US8932958B2Device manufacturing and cleaning methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jan 13, 2015·0 cites·20 claims
- 3655US8906583B2Stacked maskTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Dec 9, 2014·0 cites·20 claims
- 3749US9915866B2Focused radiation beam induced depositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 13, 2018·0 cites·20 claims
- 3849US9910350B2Method for repairing a maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 6, 2018·0 cites·20 claims
- 3949US9138785B2Method and apparatus for enhanced cleaning and inspectionLU CHI-LUN·Filed 2012·Granted Sep 22, 2015·0 cites·19 claims
- 4047US9870612B2Method for repairing a maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 16, 2018·0 cites·20 claims
- 4146US8598042B1Device manufacturing and cleaning methodLU CHI-LUN·Filed 2012·Granted Dec 3, 2013·0 cites·20 claims
- 4246US7316872B2Etching bias reductionTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jan 8, 2008·0 cites·13 claims
- 4346US2009258159A1Novel treatment for mask surface chemical reductionTAIWAN SEMICONDUCTOR MFG·Filed 2008·Application pending·0 cites
- 4445US8656318B2System and method for combined intraoverlay metrology and defect inspectionLEE HSIN-CHANG·Filed 2012·Granted Feb 18, 2014·0 cites·19 claims
- 4543US8626580B2Coupon-point system for managing supportive services to business in a semiconductor foundry environmentCHIN SHENG-CHI·Filed 2006·Granted Jan 7, 2014·0 cites·21 claims
- 4641US8609545B2Method to improve mask critical dimension uniformity (CDU)HUANG I-HSIUNG·Filed 2008·Granted Dec 17, 2013·0 cites·12 claims
- 4741US2004225488A1System and method for examining mask pattern fidelityFiled 2003·Application pending·0 cites
- 4837US2004265704A1Multiple-exposure defect eliminationTAIWAN SEMICONDUCTOR MFG·Filed 2003·Application pending·0 cites
- 4936US7381344B1Method to reduce particle level for dry-etchTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Jun 3, 2008·5 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →