Inventor · disambiguated record
Shuo-Yen Chou
Also filed as: CHOU SHUO-YEN
23 granted patents·4 pending applications·800 citations·filing 1999–2025
95Inventor score
Top patents by PatentIndex Score
27 records- 0198US8812999B2Method and system of mask data preparation for curvilinear mask patterns for a deviceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Aug 19, 2014·58 cites·19 claims
- 0298US8716841B1Photolithography mask and processTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted May 6, 2014·66 cites·20 claims
- 0397US11320747B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 3, 2022·3 cites·20 claims
- 0497US11243472B2Optical proximity correction and photomasksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 8, 2022·4 cites·20 claims
- 0597US10678142B2Optical proximity correction and photomasksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 9, 2020·13 cites·20 claims
- 0696US9256709B2Method for integrated circuit mask patterningTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Feb 9, 2016·545 cites·20 claims
- 0795US11789370B2Optical proximity correction and photomasksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 17, 2023·2 cites·20 claims
- 0895US8850366B2Method for making a mask by forming a phase bar in an integrated circuit design layoutLIU RU-GUN·Filed 2012·Granted Sep 30, 2014·79 cites·20 claims
- 0993US11709435B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 25, 2023·1 cites·20 claims
- 1086US12235589B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 25, 2025·0 cites·20 claims
- 1186US9747408B2Generating final mask pattern by performing inverse beam technology processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 29, 2017·5 cites·20 claims
- 1285US9990460B2Source beam optimization method for improving lithography printabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 5, 2018·2 cites·20 claims
- 1382US9495507B2Method for integrated circuit mask patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 15, 2016·2 cites·20 claims
- 1481US12265334B2Optical proximity correction and photomasksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 1, 2025·0 cites·20 claims
- 1578US10417376B2Source beam optimization method for improving lithography printabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 17, 2019·1 cites·20 claims
- 1678US10025175B2Method and system to prepare, manufacture and inspect mask patterns for a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jul 17, 2018·4 cites·20 claims
- 1778US2025147431A1Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1873US2022350236A1Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 1970US10083270B2Target optimization method for improving lithography printabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Sep 25, 2018·1 cites·20 claims
- 2069US10866525B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·0 cites·20 claims
- 2163US11211374B2Photomask design for generating plasmonic effectTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 28, 2021·0 cites·20 claims
- 2260US2020041892A1Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Application pending·0 cites
- 2354US10685950B2Photomask design for generating plasmonic effectTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 16, 2020·0 cites·20 claims
- 2448US6242361B1Plasma treatment to improve DUV photoresist processIND TECH RES INST·Filed 1999·Granted Jun 5, 2001·14 cites·19 claims
- 2542US10698320B2Method for optimized wafer process simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 30, 2020·0 cites·20 claims
- 2640US10514613B2Pattern modification and patterning processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 24, 2019·0 cites·20 claims
- 2733US2017053058A1Model-based rule table generationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →