Inventor · disambiguated record
Shyam Garg
Also filed as: GARG SHYAM · GARG SHYAM G
16 granted patents·640 citations·filing 1983–1998
95Inventor score
Top patents by PatentIndex Score
16 records- 0196US5717632AApparatus and method for multiple-level storage in non-volatile memoriesADVANCED MICRO DEVICES INC·Filed 1996·Granted Feb 10, 1998·219 cites·26 claims
- 0290US5774395AElectrically erasable reference cell for accurately determining threshold voltage of a non-volatile memory at a plurality of threshold voltage levelsADVANCED MICRO DEVICES INC·Filed 1996·Granted Jun 30, 1998·91 cites·26 claims
- 0385US4536947ACMOS process for fabricating integrated circuits, particularly dynamic memory cells with storage capacitorsINTEL CORP·Filed 1984·Granted Aug 27, 1985·43 cites·6 claims
- 0481US5811334AWafer cleaning procedure useful in the manufacture of a non-volatile memory deviceADVANCED MICRO DEVICES INC·Filed 1995·Granted Sep 22, 1998·53 cites·11 claims
- 0577US5549786AHighly selective, highly uniform plasma etch process for spin-on glassADVANCED MICRO DEVICES INC·Filed 1995·Granted Aug 27, 1996·51 cites·16 claims
- 0673US5546340ANon-volatile memory array with over-erase correctionADVANCED MICRO DEVICES INC·Filed 1995·Granted Aug 13, 1996·34 cites·23 claims
- 0772US5376573AMethod of making a flash EPROM device utilizing a single masking step for etching and implanting source regions within the EPROM core and redundancy areasADVANCED MICRO DEVICES INC·Filed 1993·Granted Dec 27, 1994·31 cites·21 claims
- 0865US5427963AMethod of making a MOS device with drain side channel implantADVANCED MICRO DEVICES INC·Filed 1993·Granted Jun 27, 1995·25 cites·20 claims
- 0959US5612253AMethod for forming ordered titanium nitride and titanium silicide upon a semiconductor wafer using a three-step anneal processADVANCED MICRO DEVICES INC·Filed 1995·Granted Mar 18, 1997·24 cites·16 claims
- 1051US4505026ACMOS Process for fabricating integrated circuits, particularly dynamic memory cellsINTEL CORP·Filed 1983·Granted Mar 19, 1985·18 cites·5 claims
- 1149US5632855AThermal oxide etch techniqueADVANCED MICRO DEVICES INC·Filed 1995·Granted May 27, 1997·15 cites·17 claims
- 1243US5581502AMethod for reading a non-volatile memory arrayADVANCED MICRO DEVICES INC·Filed 1995·Granted Dec 3, 1996·10 cites·23 claims
- 1342US6140216APost etch silicide formation using dielectric etchback after global planarizationADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 31, 2000·10 cites·23 claims
- 1439US5952246ANitride selective, anisotropic Cl2 /He etch processADVANCED MICRO DEVICES INC·Filed 1997·Granted Sep 14, 1999·10 cites·5 claims
- 1535US5728453AMethod of fabricating topside structure of a semiconductor deviceADVANCED MICRO DEVICES INC·Filed 1995·Granted Mar 17, 1998·6 cites·11 claims
- 1625US5989938AMethod of fabricating topside structure of a semiconductor deviceADVANCED MICRO DEVICES INC·Filed 1997·Granted Nov 23, 1999·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →