Inventor · disambiguated record
Shuji Hayase
Also filed as: HAYASE SHUJI
28 granted patents·1 pending application·1,461 citations·filing 1986–2009
98Inventor score
Files withTOSHIBA KK29
Top patents by PatentIndex Score
29 records- 0198US6025117AMethod of forming a pattern using polysilaneTOSHIBA KK·Filed 1997·Granted Feb 15, 2000·423 cites·4 claims
- 0297US4822716APolysilanes, Polysiloxanes and silicone resist materials containing these compoundsTOSHIBA KK·Filed 1986·Granted Apr 18, 1989·120 cites·5 claims
- 0396US5017453AA silicone resist materials containing a polysiloxane and a photo-sensitive agentTOSHIBA KK·Filed 1989·Granted May 21, 1991·81 cites·9 claims
- 0495US6384321B1Electrolyte composition, photosensitized solar cell using said electrolyte composition, and method of manufacturing photosensitized solar cellTOSHIBA KK·Filed 2000·Granted May 7, 2002·99 cites·25 claims
- 0595US5198520APolysilanes, polysiloxanes and silicone resist materials containing these compoundsTOSHIBA KK·Filed 1991·Granted Mar 30, 1993·97 cites·8 claims
- 0693US6569595B1Method of forming a patternTOSHIBA KK·Filed 2000·Granted May 27, 2003·58 cites·10 claims
- 0792US6002522AOptical functional element comprising photonic crystalTOSHIBA KK·Filed 1997·Granted Dec 14, 1999·108 cites·20 claims
- 0891US5866471AMethod of forming semiconductor thin film and method of fabricating solar cellTOSHIBA KK·Filed 1996·Granted Feb 2, 1999·128 cites·21 claims
- 0984US4988601APhotosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenolTOSHIBA KK·Filed 1988·Granted Jan 29, 1991·36 cites·5 claims
- 1081US7538169B2Ion conductive film and fuel cell using the sameTOSHIBA KK·Filed 2005·Granted May 26, 2009·3 cites·18 claims
- 1178US6270948B1Method of forming patternTOSHIBA KK·Filed 1999·Granted Aug 7, 2001·54 cites·12 claims
- 1275US6936365B2Ion conductive film and fuel cell using the sameTOSHIBA KK·Filed 2001·Granted Aug 30, 2005·12 cites·11 claims
- 1374US6022814AMaterial of forming silicon oxide film, silicon oxide film, method of forming silicon oxide film and semiconductor elementTOSHIBA KK·Filed 1998·Granted Feb 8, 2000·44 cites·4 claims
- 1473US5907008ABlack coloring composition, high heat resistance light-shielding component, array substrate, liquid crystal and method of manufacturing array substrateTOSHIBA KK·Filed 1997·Granted May 25, 1999·26 cites·7 claims
- 1569US6437090B1Curing catalyst, resin composition, resin-sealed semiconductor device and coating materialTOSHIBA KK·Filed 1999·Granted Aug 20, 2002·21 cites·16 claims
- 1667US6291129B1Monomer, high molecular compound and photosensitive compositionTOSHIBA KK·Filed 1998·Granted Sep 18, 2001·22 cites·27 claims
- 1767US5969059AImpregnation resin compositionTOSHIBA KK·Filed 1998·Granted Oct 19, 1999·20 cites·12 claims
- 1862US6410748B1Alicycli c group-containing monomerTOSHIBA KK·Filed 2001·Granted Jun 25, 2002·15 cites·3 claims
- 1961US2009197139A1Ion conductive film and fuel cell using the sameTOSHIBA KK·Filed 2009·Application pending·0 cites
- 2059US7196264B2Dye sensitized solar cell and method for manufacturing dye sensitized solar cellTOSHIBA KK·Filed 2002·Granted Mar 27, 2007·6 cites·15 claims
- 2159US5372908APhotosensitive composition comprising a polysilane and an acid forming compoundTOSHIBA KK·Filed 1992·Granted Dec 13, 1994·20 cites·19 claims
- 2258US5985513APhotosensitive composition comprising aryl-substituted polysilane and peroxide-substituted benzophenoneTOSHIBA KK·Filed 1997·Granted Nov 16, 1999·17 cites·7 claims
- 2357US7812252B2Dye sensitized solar cell and method for manufacturing dye sensitized solar cellTOSHIBA KK·Filed 2007·Granted Oct 12, 2010·0 cites·6 claims
- 2450US6004730AMethod of forming an insulating film pattern and photosensitive compositionTOSHIBA KK·Filed 1997·Granted Dec 21, 1999·12 cites·15 claims
- 2548US7126054B2Raw material kit for electrolytic composition, electrolytic composition, and dye-sensitized solar cellTOSHIBA KK·Filed 2002·Granted Oct 24, 2006·4 cites·9 claims
- 2648US5624788AOrganic silicon compound, resist thermal polymerization composition and photopolymerization compositionTOSHIBA KK·Filed 1995·Granted Apr 29, 1997·9 cites·13 claims
- 2747US5362559APolysilane monomolecular film and polysilane built-up filmTOSHIBA KK·Filed 1993·Granted Nov 8, 1994·10 cites·38 claims
- 2846US5994007APattern forming method utilizing first insulative and then conductive overlayer and underlayerTOSHIBA KK·Filed 1998·Granted Nov 30, 1999·9 cites·20 claims
- 2944US5773192AOrganic silicon compound, resist, thermal polymerization composition and photopolymerization compositionTOSHIBA KK·Filed 1997·Granted Jun 30, 1998·7 cites·19 claims
Join the waitlist — get patent alerts
Get an alert when Shuji Hayase files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →