Inventor · disambiguated record
Shinichi Hidesaka
Also filed as: HIDESAKA SHINICHI
10 granted patents·38 citations·filing 1997–2013
85Inventor score
Files withTOKYO OHKA KOGYO CO LTD10
Top patents by PatentIndex Score
10 records- 0190US7927780B2Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Apr 19, 2011·9 cites·11 claims
- 0273US7582406B2Resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Sep 1, 2009·3 cites·14 claims
- 0371US8367297B2Resist composition, method of forming resist pattern, novel compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Feb 5, 2013·3 cites·12 claims
- 0463US6551755B2Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Apr 22, 2003·7 cites·5 claims
- 0559US6312863B1Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Nov 6, 2001·5 cites·12 claims
- 0655US7781144B2Positive resist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Aug 24, 2010·5 cites·4 claims
- 0738US5702862APositive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanoneTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Dec 30, 1997·6 cites·9 claims
- 0837US9740105B2Resist pattern formation method and resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Aug 22, 2017·0 cites·8 claims
- 0929US7858286B2Positive resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Dec 28, 2010·0 cites·5 claims
- 1029US7329478B2Chemical amplified positive photo resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Feb 12, 2008·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →