Inventor · disambiguated record
Sheng-Chang Hsu
Also filed as: HSU SHENG-CHANG
8 granted patents·1 pending application·8 citations·filing 2017–2025
77Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD9
Top patents by PatentIndex Score
9 records- 0190US11209736B2Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 28, 2021·5 cites·20 claims
- 0281US10508953B2Method and system for processing substrate by chemical solution in semiconductor manufacturing fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 17, 2019·3 cites·20 claims
- 0374US2025216791A1Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0473US12282260B2Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 22, 2025·0 cites·20 claims
- 0568US11567400B2Method of fabricating a photomask and method of inspecting a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 31, 2023·0 cites·20 claims
- 0653US11048163B2Inspection method of a photomask and an inspection systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 29, 2021·0 cites·20 claims
- 0752US10101651B1Photo mask assembly and optical apparatus including the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 16, 2018·0 cites·20 claims
- 0843US11953448B2Method for defect inspectionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 9, 2024·0 cites·20 claims
- 0942US10459332B2Mask blank and fabrication method thereof, and method of fabricating photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 29, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →