Inventor · disambiguated record
Shohei Iwamori
Also filed as: IWAMORI SHOHEI
0 granted patents·18 pending applications·0 citations·filing 2023–2024
Top patents by PatentIndex Score
18 records- 0164US2025208510A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0263US2024402606A1Composition For Forming Resist Underlayer Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0357US2025208506A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0457US2025208511A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0557US2025004378A1Pattern Forming MethodSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0657US2025231485A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0757US2025208512A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0857US2025208509A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0956US2025129209A1Composition For Forming Resist Underlayer Film, Resist Underlayer Film, Method For Manufacturing Resist Underlayer Film, Patterning Process, And Method For Manufacturing Semiconductor DeviceSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1056US2025123565A1Composition for forming resist underlayer film, resist underlayer film, method for manufacturing resist underlayer film, patterning process, and method for manufacturing semiconductor deviceSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1155US2025087495A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1255US2025085636A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1354US2025368837A1Composition For Forming Metal-Containing Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1454US2024295816A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1554US2024242967A1Polymer For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1653US2024297041A1Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1753US2024116958A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, Patterning Process, And Semiconductor Photoresist MaterialSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1851US2024402596A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHIN ETSU CHIMICAL CO LTD·Filed 2024·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →