Inventor · disambiguated record
Shena Jia
Also filed as: JIA SHENA
9 granted patents·11 pending applications·5 citations·filing 2012–2025
77Inventor score
Top patents by PatentIndex Score
20 records- 0182US10297472B2Method and apparatus for cleaning semiconductor waferACM RESEARCH SHANGHAI INC·Filed 2012·Granted May 21, 2019·5 cites·29 claims
- 0277US12186684B2Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic deviceACM RESEARCH SHANGHAI INC·Filed 2024·Granted Jan 7, 2025·0 cites·13 claims
- 0372US2025285882A1Method and apparatus for removing particles or photoresist on substratesACM RESEARCH SHANGHAI INC·Filed 2025·Application pending·0 cites
- 0466US11925881B2Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic deviceACM RESEARCH SHANGHAI INC·Filed 2021·Granted Mar 12, 2024·0 cites·11 claims
- 0561US2025109495A1Furnace tube for thin film deposition, thin film deposition method and processing apparatusACM RESEARCH SHANGHAI INC·Filed 2022·Application pending·0 cites
- 0659US2024368766A1Thin film deposition device, thin film deposition method and thin film deposition apparatusACM RESEARCH SHANGHAI INC·Filed 2022·Application pending·0 cites
- 0758US11462423B2Method and apparatus for cleaning semiconductor waferACM RESEARCH SHANGHAI INC·Filed 2019·Granted Oct 4, 2022·0 cites·14 claims
- 0857US12334367B2Method and apparatus for removing particles or photoresist on substratesACM RESEARCH SHANGHAI INC·Filed 2020·Granted Jun 17, 2025·0 cites·32 claims
- 0954US2025001465A1Substrate processing apparatus and methodACM RESEARCH SHANGHAI INC·Filed 2022·Application pending·0 cites
- 1052US12482697B2Substrate supporting apparatusACM RESEARCH SHANGHAI INC·Filed 2020·Granted Nov 25, 2025·0 cites·10 claims
- 1152US2024282644A1Deviation measurement deviceACM RESEARCH SHANGHAI INC·Filed 2022·Application pending·0 cites
- 1252US2024266192A1Substrate treatment apparatusACM RESEARCH SHANGHAI INC·Filed 2022·Application pending·0 cites
- 1351US2025157841A1Substrate cleaning apparatus and turn-over device thereofACM RESEARCH SHANGHAI INC·Filed 2023·Application pending·0 cites
- 1450US2025029848A1High-temperature tube furnaceACM RESEARCH SHANGHAI INC·Filed 2021·Application pending·0 cites
- 1549US11000782B2Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic deviceACM RESEARCH SHANGHAI INC·Filed 2015·Granted May 11, 2021·0 cites·5 claims
- 1649US2024347361A1Flipping apparatusACM RESEARCH SHANGHAI INC·Filed 2022·Application pending·0 cites
- 1746US2024363370A1Drying apparatus and method based on supercritical fluidACM RESEARCH SHANGHAI INC·Filed 2021·Application pending·0 cites
- 1843US11498100B2Apparatus for cleaning semiconductor substratesACM RESEARCH SHANGHAI INC·Filed 2017·Granted Nov 15, 2022·0 cites·20 claims
- 1940US10770315B2Fall-proof apparatus for cleaning semiconductor devices and a chamber with the apparatusACM RESEARCH SHANGHAI INC·Filed 2015·Granted Sep 8, 2020·0 cites·26 claims
- 2033US2018308729A1Hybrid substrate processing system for dry and wet process and substrate processing method thereofACN CO LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →