Inventor · disambiguated record
Shohei Kataoka
Also filed as: KATAOKA SHOHEI
27 granted patents·16 pending applications·58 citations·filing 2008–2025
93Inventor score
Top patents by PatentIndex Score
43 records- 0192US9250519B2Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the methodFUJIFILM CORP·Filed 2014·Granted Feb 2, 2016·8 cites·20 claims
- 0290US9523912B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compoundFUJIFILM CORP·Filed 2015·Granted Dec 20, 2016·7 cites·14 claims
- 0388US8557499B2Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the compositionYAMAGUCHI SHUHEI·Filed 2010·Granted Oct 15, 2013·5 cites·18 claims
- 0486US8841060B2Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic deviceKATAOKA SHOHEI·Filed 2012·Granted Sep 23, 2014·12 cites·20 claims
- 0584US8999622B2Pattern forming method, chemical amplification resist composition and resist filmFUJIFILM CORP·Filed 2012·Granted Apr 7, 2015·4 cites·13 claims
- 0684US8329379B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the sameITO TAKAYUKI·Filed 2010·Granted Dec 11, 2012·6 cites·21 claims
- 0774US9405197B2Pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Aug 2, 2016·2 cites·18 claims
- 0872US10248019B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist filmFUJIFILM CORP·Filed 2012·Granted Apr 2, 2019·1 cites·9 claims
- 0972US9709892B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the sameKATAOKA SHOHEI·Filed 2011·Granted Jul 18, 2017·2 cites·9 claims
- 1070US7829609B2Composition, article and their production method, and film and its production methodFUJIFILM CORP·Filed 2008·Granted Nov 9, 2010·6 cites·19 claims
- 1169US2025262855A1Liquid jetting structure body, liquid jetting head, liquid jetting device, manufacturing method of liquid jetting structure body, and laminateFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 1267US10717706B2M-phenylenediamine compound and method for producing polymer compound using sameFUJIFILM CORP·Filed 2019·Granted Jul 21, 2020·0 cites·9 claims
- 1367US2025034327A1Polyester resin and molded product including the sameFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 1464US9551935B2Pattern forming method and resist compositionKATO KEITA·Filed 2011·Granted Jan 24, 2017·1 cites·34 claims
- 1563US9120288B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic deviceTAKAHASHI HIDENORI·Filed 2012·Granted Sep 1, 2015·1 cites·14 claims
- 1662US12486422B2Textile printing ink set and textile printing methodFUJIFILM CORP·Filed 2022·Granted Dec 2, 2025·0 cites·7 claims
- 1757US2014127629A1Method of forming patternFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 1856US11201352B2Electrolytic solution for non-aqueous secondary battery, non-aqueous secondary battery, and metal complexFUJIFILM CORP·Filed 2019·Granted Dec 14, 2021·0 cites·5 claims
- 1956US2025179244A1Polycarbonate resin and molded product containing sameFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 2055US2017102618A1Method of forming patternFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 2153US8846293B2Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same compositionIIZUKA YUSUKE·Filed 2012·Granted Sep 30, 2014·3 cites·13 claims
- 2253US8663907B2Method of forming patternKATO KEITA·Filed 2011·Granted Mar 4, 2014·0 cites·18 claims
- 2352US10923769B2Electrolytic solution for non-aqueous secondary battery and non-aqueous secondary batteryFUJIFILM CORP·Filed 2019·Granted Feb 16, 2021·0 cites·4 claims
- 2448US10649329B2Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted May 12, 2020·0 cites·17 claims
- 2546US9223204B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the sameITO TAKAYUKI·Filed 2012·Granted Dec 29, 2015·0 cites·17 claims
- 2646US2014212814A1Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern using the composition, process for manufacturing electronic device and electronic deviceFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 2746US2015111157A1Method of forming pattern and actinic-ray- or radiation-sensitive resin composition for use in the methodFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 2845US9454079B2Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming patternFUJIFILM CORP·Filed 2014·Granted Sep 27, 2016·0 cites·11 claims
- 2944US9482947B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic deviceFUJIFILM CORP·Filed 2013·Granted Nov 1, 2016·0 cites·40 claims
- 3044US2014234762A1Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic deviceFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 3144US2014234759A1Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming patternFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 3243US2014011134A1Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist filmFUJIFILM CORP·Filed 2013·Application pending·0 cites
- 3339US9152049B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionKATAOKA SHOHEI·Filed 2010·Granted Oct 6, 2015·0 cites·16 claims
- 3438US10126653B2Pattern forming method and resist compositionIWATO KAORU·Filed 2011·Granted Nov 13, 2018·0 cites·20 claims
- 3538US9316910B2Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist filmKATAOKA SHOHEI·Filed 2012·Granted Apr 19, 2016·0 cites·16 claims
- 3637US8895222B2Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the compositionTSUCHIMURA TOMOTAKA·Filed 2010·Granted Nov 25, 2014·0 cites·10 claims
- 3737US2012028196A1Method of forming pattern and organic processing liquid for use in the methodKAMIMURA SOU·Filed 2011·Application pending·0 cites
- 3836US2016070174A1Pattern forming method, active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Application pending·0 cites
- 3934US2015168830A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and method for manufacturing electronic device and electronic device, and compoundFUJIFILM CORP·Filed 2015·Application pending·0 cites
- 4032US2012164573A1Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the sameTANGO NAOHIRO·Filed 2011·Application pending·0 cites
- 4132US2012129100A1Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the sameSHIBUYA AKINORI·Filed 2010·Application pending·0 cites
- 4232US2015277225A1Actinic-ray-sensitive or radiation-sensitive resin composition, resist film formed using said composition, method for forming pattern using said composition, process for producing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Application pending·0 cites
- 4330US8846290B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the sameTANGO NAOHIRO·Filed 2010·Granted Sep 30, 2014·0 cites·29 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →