Inventor · disambiguated record
Shota Katayama
Also filed as: KATAYAMA SHOTA
7 granted patents·10 pending applications·0 citations·filing 2014–2023
66Inventor score
Top patents by PatentIndex Score
17 records- 0160US2024045330A1Negative photosensitive composition and pattern formation methodTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 0251US2025170800A1Production method for hollow structure, laminateTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 0348US9372403B2Chemically amplified photosensitive resin composition and method for producing resist pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jun 21, 2016·0 cites·7 claims
- 0445US2020292939A1Photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 0545US2014316054A1Method of forming filmTOKYO OHKA KOGYO CO LTD·Filed 2014·Application pending·0 cites
- 0644US2023229084A1Chemically amplified photosensitive composition, photosensitive dry film, production method of substrate having template for plating, and production method of plated articleTOKYO OHKA KOGYO CO LTD·Filed 2021·Application pending·0 cites
- 0742US2020142307A1Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 0841US11131927B2Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Sep 28, 2021·0 cites·10 claims
- 0941US2022112509A1Gene knock-in method, gene knock-in cell fabrication method, gene knock-in cell, malignant transformation risk evaluation method, cancer cell production method, and kit for use in theseIMRA JAPAN KK·Filed 2020·Application pending·0 cites
- 1040US11016387B2Chemically amplified positive-type photosensitive resin composition, method of manufacturing substrate with template, and method of manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted May 25, 2021·0 cites·8 claims
- 1140US2020209748A1Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, and method of manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 1240US2022026801A1Chemically amplified positive -type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, and method of manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 1339US11061326B2Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compoundTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Jul 13, 2021·0 cites·12 claims
- 1438US2021055655A1Method for manufacturing plated molded articleTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 1533US9557651B2Chemically amplified positive-type photosensitive resin compositionTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Jan 31, 2017·0 cites·2 claims
- 1632US10604770B2Method for extracting differentiated cellsUNIV KYOTO·Filed 2015·Granted Mar 31, 2020·0 cites·13 claims
- 1726US10054855B2Chemically amplified positive-type photosensitive resin compositionTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Aug 21, 2018·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →