Inventor · disambiguated record
Shun Kikuchi
Also filed as: KIKUCHI SHUN
5 granted patents·19 pending applications·1 citations·filing 2019–2025
61Inventor score
Top patents by PatentIndex Score
24 records- 0184US11940728B2Molecular resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Mar 26, 2024·1 cites·8 claims
- 0270US2024319598A1Composition For Forming Silicon-Containing Resist Underlayer Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0368US12436462B2Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Granted Oct 7, 2025·0 cites·12 claims
- 0467US2025377593A1Resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0567US2025377588A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0666US2025291245A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0764US2024377730A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0864US2024345480A1Molecular resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0963US2025306459A1Resist composition and pattern forming methodSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1063US2025314962A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1163US2025314963A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1263US2025314966A1Resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1363US2025244666A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1463US2025314967A1Resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1563US2025306458A1Resist composition and pattern forming methodSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1662US2025377592A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1762US2024272550A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1860US2023367211A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1957US12204245B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jan 21, 2025·0 cites·13 claims
- 2053US2024116958A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, Patterning Process, And Semiconductor Photoresist MaterialSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 2152US2023161255A1Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 2249US2025291249A1Resist composition, laminate, and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 2347US11567392B2Imaging apparatus, imaging control method, interchangeable lens and diaphragm driving methodSONY CORP·Filed 2019·Granted Jan 31, 2023·0 cites·18 claims
- 2442US11451702B2Image capturing system and driving method for reducing noise in a captured imageSONY CORP·Filed 2019·Granted Sep 20, 2022·0 cites·19 claims
Join the waitlist — get patent alerts
Get an alert when Shun Kikuchi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →