Inventor · disambiguated record
Shin Kyung Kim
Also filed as: KIM SHIN K · KIM SHIN KYUNG
3 granted patents·10 pending applications·6 citations·filing 2005–2025
57Inventor score
Top patents by PatentIndex Score
13 records- 0166US2025387832A1Segment for diamond tool and method of manufacturing the sameSHINHAN DIAMOND IND CO LTD·Filed 2025·Application pending·0 cites
- 0264US2024342861A1Diamond tool and method of manufacturing the sameSHINHAN DIAMOND IND CO LTD·Filed 2024·Application pending·0 cites
- 0361US7128066B2Diamond tool with metal plate inserted thereinSHIHAN DIAMOND IND CO LTD·Filed 2005·Granted Oct 31, 2006·5 cites·18 claims
- 0456US2016121454A1Cmp pad conditioner and method for manufacturing the sameSHINHAN DIAMOND IND CO LTD·Filed 2015·Application pending·0 cites
- 0549US2013225052A1"cmp pad conditioner and method for manufacturing the same"SONG JUN HO·Filed 2011·Application pending·0 cites
- 0646US10632552B2Saw blade having noise and stress-reduction structureSHINHAN DIAMOND IND CO LTD·Filed 2016·Granted Apr 28, 2020·0 cites·14 claims
- 0744US2010043304A1Diamond tool and method of manufacturing the sameSHINHAN DIAMOND IND CO LTD·Filed 2007·Application pending·0 cites
- 0844US2010048112A1Diamond tool and method of manufacturing the sameSHINHAN DIAMOND IND CO LTD·Filed 2007·Application pending·0 cites
- 0942US8100997B2Diamond tools with multilayers of abrasive grain and method for manufacturing the sameSONG MIN-SEOK·Filed 2005·Granted Jan 24, 2012·1 cites·19 claims
- 1042US2018099376A1Attachment removing device for diamond toolSHINHAN DIAMOND IND CO LTD·Filed 2017·Application pending·0 cites
- 1141US2021016417A1Cmp pad conditioner and method for manufacturing the sameSHINHAN DIAMOND IND CO LTD·Filed 2020·Application pending·0 cites
- 1239US2011053479A1Hydrophobic cutting tool and method for manufacturing the sameSHINHAN DIAMOND IND CO LTD·Filed 2008·Application pending·0 cites
- 1337US2005193866A1Cutting wheel with blank and manufacturing method thereofSHINHAN DIAMOND IND CO LTD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →