Inventor · disambiguated record
Shing-Long Lee
Also filed as: LEE SHING LONG
8 granted patents·221 citations·filing 1997–2013
88Inventor score
Top patents by PatentIndex Score
8 records- 0190US5872061APlasma etch method for forming residue free fluorine containing plasma etched layersTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Feb 16, 1999·121 cites·14 claims
- 0272US9460957B2Method and structure for nitrogen-doped shallow-trench isolation dielectricTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Oct 4, 2016·3 cites·18 claims
- 0368US6245666B1Method for forming a delamination resistant multi-layer dielectric layer for passivating a conductor layerTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Jun 12, 2001·20 cites·16 claims
- 0465US5943582AMethod for forming DRAM stacked capacitorTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Aug 24, 1999·26 cites·23 claims
- 0561US6926590B1Method of improving device performanceTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Aug 9, 2005·8 cites·23 claims
- 0658US5783482AMethod to prevent oxide peeling induced by sog etchback on the wafer edgeTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Jul 21, 1998·25 cites·14 claims
- 0756US7511936B2Method and apparatus for dynamic plasma treatment of bipolar ESC systemTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Mar 31, 2009·1 cites·27 claims
- 0849US5877092AMethod for edge profile and design rules controlTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Mar 2, 1999·17 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →