Inventor · disambiguated record
Shin-Rung Lu
Also filed as: LU SHIN-RUNG
13 granted patents·1 pending application·61 citations·filing 2002–2015
89Inventor score
Top patents by PatentIndex Score
14 records- 0189US9442392B2Scanner overlay correction system and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 13, 2016·10 cites·20 claims
- 0289US8889434B2Scanner overlay correction system and methodTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Nov 18, 2014·8 cites·12 claims
- 0379US8288063B2Defense system in advanced process controlLU SHIN-RUNG·Filed 2010·Granted Oct 16, 2012·4 cites·19 claims
- 0478US6943124B1Two step exposure to strengthen structure of polyimide or negative tone photosensitive materialTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Sep 13, 2005·24 cites·32 claims
- 0577US9646896B2Lithographic overlay samplingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted May 9, 2017·4 cites·20 claims
- 0670US8867018B2Method and system for improved overlay correctionLU SHIN-RUNG·Filed 2009·Granted Oct 21, 2014·6 cites·19 claims
- 0767US8239056B2Advanced process control for new tapeout productHSU CHIH-WEI·Filed 2009·Granted Aug 7, 2012·2 cites·20 claims
- 0861US7687211B2System and method for photolithography in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Mar 30, 2010·1 cites·11 claims
- 0957US9082661B2Scanner overlay correction system and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jul 14, 2015·0 cites·20 claims
- 1052US7494928B2Method for patterning and etching a passivation layerTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Feb 24, 2009·2 cites·20 claims
- 1144US9477219B2Dynamic compensation in advanced process controlHSU CHIH-WEI·Filed 2010·Granted Oct 25, 2016·0 cites·20 claims
- 1241US9733577B2Intra-field process control for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 15, 2017·0 cites·20 claims
- 1335US9588446B2Calibration apparatus and an adjustment method for a lithography apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 7, 2017·0 cites·17 claims
- 1428US2005054210A1Multiple exposure method for forming patterned photoresist layerTAIWAN SEMICONDUCTOR MFG·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →