Inventor · disambiguated record
Shin-Ya Nakafuji
Also filed as: NAKAFUJI SHIN-YA
17 granted patents·3 pending applications·36 citations·filing 2011–2022
90Inventor score
Top patents by PatentIndex Score
20 records- 0189US9400429B2Composition for forming a resist underlayer film, and pattern-forming methodJSR CORP·Filed 2015·Granted Jul 26, 2016·7 cites·16 claims
- 0287US8715916B2Pattern forming method and resist underlayer film-forming compositionMINEGISHI SHIN-YA·Filed 2012·Granted May 6, 2014·8 cites·7 claims
- 0384US9581905B2Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compoundJSR CORP·Filed 2015·Granted Feb 28, 2017·6 cites·12 claims
- 0483US8871432B2Pattern-forming method, resist underlayer film, and composition for forming resist underlayer filmJSR CORP·Filed 2013·Granted Oct 28, 2014·4 cites·10 claims
- 0577US9090119B2Pattern forming methodJSR CORP·Filed 2014·Granted Jul 28, 2015·3 cites·6 claims
- 0675US9170493B2Resist underlayer film-forming composition, pattern-forming method and resist underlayer filmJSR CORP·Filed 2013·Granted Oct 27, 2015·3 cites·16 claims
- 0770US9620378B1Composition for film formation, film, production method of patterned substrate, and compoundJSR CORP·Filed 2015·Granted Apr 11, 2017·2 cites·15 claims
- 0870US9040232B2Method for pattern formation, method and composition for resist underlayer film formation, and resist underlayer filmMINEGISHI SHIN-YA·Filed 2011·Granted May 26, 2015·2 cites·9 claims
- 0962US12265333B2Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compoundJSR CORP·Filed 2021·Granted Apr 1, 2025·0 cites·16 claims
- 1061US2024389227A1Radiation-sensitive composition for forming insulation film, resin film having pattern, and semiconductor circuit boardJSR CORP·Filed 2022·Application pending·0 cites
- 1160US9091922B2Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming methodJSR CORP·Filed 2012·Granted Jul 28, 2015·1 cites·24 claims
- 1252US2015198882A9Composition for forming resist underlayer film, resist underlayer film and resist underlayer film-forming method, and pattern-forming methodJSR CORP·Filed 2014·Application pending·0 cites
- 1349US11880138B2Composition, pattern-forming method, and compound-producing methodJSR CORP·Filed 2021·Granted Jan 23, 2024·0 cites·7 claims
- 1448US9447303B2Composition for forming resist underlayer filmJSR CORP·Filed 2015·Granted Sep 20, 2016·0 cites·13 claims
- 1547US9696626B2Composition for forming a resist underlayer film, and pattern-forming methodJSR CORP·Filed 2016·Granted Jul 4, 2017·0 cites·19 claims
- 1646US9134611B2Composition for forming resist underlayer film and pattern-forming methodJSR CORP·Filed 2013·Granted Sep 15, 2015·0 cites·16 claims
- 1746US2020348595A1Composition, film, and production method of patterned substrateJSR CORP·Filed 2020·Application pending·0 cites
- 1844US11126084B2Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compoundJSR CORP·Filed 2019·Granted Sep 21, 2021·0 cites·19 claims
- 1933US10053539B2Composition for film formation, film, production method of patterned substrate, and compoundJSR CORP·Filed 2015·Granted Aug 21, 2018·0 cites·14 claims
- 2031US10146131B2Composition, method for producing patterned substrate, film and forming method thereof, and compoundJSR CORP·Filed 2015·Granted Dec 4, 2018·0 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →