Inventor · disambiguated record
Shigeru Nakamoto
Also filed as: NAKAMOTO SHIGERU
31 granted patents·8 pending applications·115 citations·filing 1999–2025
95Inventor score
Top patents by PatentIndex Score
39 records- 0194US11437289B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Sep 6, 2022·4 cites·6 claims
- 0292US9934946B2Plasma processing apparatus and operating method of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Apr 3, 2018·9 cites·5 claims
- 0383US8992721B2Plasma processing apparatusKAGOSHIMA AKIRA·Filed 2010·Granted Mar 31, 2015·7 cites·9 claims
- 0481US9741629B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Granted Aug 22, 2017·3 cites·6 claims
- 0581US7047093B2Semiconductor manufacturing apparatus and its diagnosis apparatus and operating systemHITACHI HIGH TECH CORP·Filed 2003·Granted May 16, 2006·22 cites·27 claims
- 0681US6795745B1Methods of operating vacuum processing equipment and methods of processing wafersHITACHI LTD·Filed 2000·Granted Sep 21, 2004·26 cites·6 claims
- 0780US2025323029A1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2025·Application pending·0 cites
- 0876US6920369B2Methods of operating vacuum processing equipment and methods of processing wafersHITACHI LTD·Filed 2004·Granted Jul 19, 2005·17 cites·3 claims
- 0971US12368031B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Granted Jul 22, 2025·0 cites·1 claims
- 1068US11308182B2Data processing method, data processing apparatus and processing apparatusHITACHI HIGH TECH CORP·Filed 2020·Granted Apr 19, 2022·0 cites·6 claims
- 1167US10020233B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2013·Granted Jul 10, 2018·2 cites·3 claims
- 1266US12131964B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Granted Oct 29, 2024·0 cites·12 claims
- 1365US11605530B2Plasma processing apparatus, data processing apparatus and data processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Mar 14, 2023·0 cites·4 claims
- 1465US9865439B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Jan 9, 2018·1 cites·4 claims
- 1562US6901306B2Semiconductor manufacturing apparatus and its diagnosis apparatus and operating systemHITACHI HIGH TECH CORP·Filed 2002·Granted May 31, 2005·7 cites·9 claims
- 1660US10783220B2Data processing method, data processing apparatus and processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Sep 22, 2020·0 cites·8 claims
- 1758US10073818B2Data processing method, data processing apparatus and processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Sep 11, 2018·0 cites·5 claims
- 1857US10262840B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Apr 16, 2019·0 cites·5 claims
- 1957US9767997B2Plasma processing apparatus and operational method thereofHITACHI HIGH TECH CORP·Filed 2014·Granted Sep 19, 2017·0 cites·6 claims
- 2056US6596551B1Etching end point judging method, etching end point judging device, and insulating film etching method using these methodsHITACHI LTD·Filed 1999·Granted Jul 22, 2003·17 cites·15 claims
- 2155US11355324B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted Jun 7, 2022·0 cites·9 claims
- 2255US10615010B2Plasma processing apparatus, data processing apparatus and data processing methodHITACHI HIGH TECH CORP·Filed 2016·Granted Apr 7, 2020·0 cites·1 claims
- 2354US11424110B2Plasma processing apparatus and operational method thereofHITACHI HIGH TECH CORP·Filed 2017·Granted Aug 23, 2022·0 cites·1 claims
- 2450US2007178610A1Semiconductor Production ApparatusUSUI TATEHITO·Filed 2007·Application pending·0 cites
- 2549US11569135B2Plasma processing method and wavelength selection method used in plasma processingHITACHI HIGH TECH CORP·Filed 2019·Granted Jan 31, 2023·0 cites·16 claims
- 2649US2017358504A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2017·Application pending·0 cites
- 2748US12381071B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2020·Granted Aug 5, 2025·0 cites·7 claims
- 2847US12051574B2Wafer processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 30, 2024·0 cites·4 claims
- 2947US11875978B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Jan 16, 2024·0 cites·15 claims
- 3047US10872774B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2019·Granted Dec 22, 2020·0 cites·6 claims
- 3145US2024297027A1Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 3243US9190336B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2014·Granted Nov 17, 2015·0 cites·8 claims
- 3342US2005194095A1Semiconductor production apparatusFiled 2004·Application pending·0 cites
- 3441US12062530B2Vacuum processing apparatus and vacuum processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Aug 13, 2024·0 cites·6 claims
- 3541US2003036282A1Etching end point judging deviceFiled 2002·Application pending·0 cites
- 3640US9805940B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2016·Granted Oct 31, 2017·0 cites·5 claims
- 3738US8784677B2Plasma processing apparatus and plasma processing methodSHIRAISHI DAISUKE·Filed 2010·Granted Jul 22, 2014·0 cites·4 claims
- 3838US2008216956A1Plasma processing apparatusNAKAMOTO SHIGERU·Filed 2007·Application pending·0 cites
- 3936US2015041060A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →