Inventor · disambiguated record
Shuji Nakao
Also filed as: NAKAO SHUJI
45 granted patents·7 pending applications·825 citations·filing 1987–2010
98Inventor score
Files withMITSUBISHI ELECTRIC CORP30RENESAS TECH CORP14MINOLTA CO LTD4RENESAS ELECTRONICS CORP3KONICA MINOLTA BUSINESS TECH1
Top patents by PatentIndex Score
52 records- 0189US7459265B2Pattern forming method, semiconductor device manufacturing method and exposure mask setRENESAS TECH CORP·Filed 2005·Granted Dec 2, 2008·10 cites·13 claims
- 0287US6171662B1Method of surface processingMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Jan 9, 2001·76 cites·12 claims
- 0386US5945982AData administration apparatus that can search for desired image data using mapsMINOLTA CO LTD·Filed 1996·Granted Aug 31, 1999·143 cites·36 claims
- 0486US5882827APhase shift mask, method of manufacturing phase shift mask and method of forming a pattern using phase shift maskMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Mar 16, 1999·62 cites·5 claims
- 0581US7209250B2Data processing apparatus, print-setting method, and recording mediumMINOLTA CO LTD·Filed 2001·Granted Apr 24, 2007·31 cites·19 claims
- 0681US4806829AApparatus utilizing charged particlesMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Feb 21, 1989·25 cites·35 claims
- 0780US7670756B2Pattern forming method, semiconductor device manufacturing method and exposure mask setRENESAS TECH CORP·Filed 2008·Granted Mar 2, 2010·4 cites·11 claims
- 0879US6709792B2Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo maskRENESAS TECH CORP·Filed 2002·Granted Mar 23, 2004·17 cites·1 claims
- 0977US8017305B2Pattern forming method, semiconductor device manufacturing method and exposure mask setRENESAS ELECTRONICS CORP·Filed 2010·Granted Sep 13, 2011·2 cites·7 claims
- 1076US6811939B2Focus monitoring method, focus monitoring system, and device fabricating methodRENESAS TECH CORP·Filed 2002·Granted Nov 2, 2004·19 cites·8 claims
- 1175US7033091B2Printing control device and image forming deviceKONICA MINOLTA BUSINESS TECH·Filed 2004·Granted Apr 25, 2006·19 cites·15 claims
- 1275US6134008AAligner and patterning method using phase shift maskMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Oct 17, 2000·31 cites·4 claims
- 1374US6743554B2Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for deviceRENESAS TECH CORP·Filed 2002·Granted Jun 1, 2004·14 cites·12 claims
- 1474US5863677AAligner and patterning method using phase shift maskMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Jan 26, 1999·30 cites·5 claims
- 1572US5958656APattern forming method using phase shift maskMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Sep 28, 1999·32 cites·5 claims
- 1671US7824843B2Pattern forming method, electronic device manufacturing method and electronic deviceRENESAS ELECTRONICS CORP·Filed 2008·Granted Nov 2, 2010·2 cites·11 claims
- 1770US6797443B2Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor deviceRENESAS TECH CORP·Filed 2001·Granted Sep 28, 2004·13 cites·9 claims
- 1869US5858625APhase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting maskMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Jan 12, 1999·26 cites·2 claims
- 1968US6828080B2Pattern forming method and method of fabricating deviceRENESAS TECH CORP·Filed 2002·Granted Dec 7, 2004·9 cites·15 claims
- 2067US6764794B2Photomask for focus monitoringRENESAS TECH CORP·Filed 2002·Granted Jul 20, 2004·11 cites·14 claims
- 2166US6994940B2Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic deviceRENESAS TECH CORP·Filed 2003·Granted Feb 7, 2006·8 cites·10 claims
- 2266US6369906B1Image reproduction apparatus and method for controlling image reproduction apparatusMINOLTA CO LTD·Filed 1998·Granted Apr 9, 2002·31 cites·20 claims
- 2366US5536602APhase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting maskMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Jul 16, 1996·28 cites·13 claims
- 2461US5868849ASurface processing deviceMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Feb 9, 1999·22 cites·7 claims
- 2560US6605411B2Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo maskMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Aug 12, 2003·5 cites·17 claims
- 2660US6329306B1Fine patterning utilizing an exposure method in photolithographyMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Dec 11, 2001·5 cites·4 claims
- 2760US5698348APhase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting maskMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Dec 16, 1997·18 cites·2 claims
- 2859US5744268APhase shift mask, method of manufacturing a phase shift mask and method of forming a pattern with phase shift maskMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Apr 28, 1998·19 cites·7 claims
- 2958US6388731B1Projection aligner and exposure method using the sameMITSUBISHI ELECTRIC CORP·Filed 2000·Granted May 14, 2002·4 cites·2 claims
- 3058US5853922APhase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting maskMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Dec 29, 1998·16 cites·7 claims
- 3156US5902702APhase shift mask, blank for phase shift mask, and method of manufacturing phase shift maskMITSUBISHI ELECTRIC CORP·Filed 1996·Granted May 11, 1999·17 cites·18 claims
- 3256US4987092AProcess for manufacturing stacked semiconductor devicesMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Jan 22, 1991·16 cites·16 claims
- 3355US5964989AIonized PVD device and method of manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Oct 12, 1999·11 cites·9 claims
- 3452US6706453B2Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo maskRENESAS TECH CORP·Filed 2002·Granted Mar 16, 2004·2 cites·3 claims
- 3551US7535585B2Computer program product executed in server computer connected to printer and client computer, and printer function description file editing methodMINOLTA CO LTD·Filed 2003·Granted May 19, 2009·2 cites·24 claims
- 3650US6890692B2Method of focus monitoring and manufacturing method for an electronic deviceRENESAS TECH CORP·Filed 2004·Granted May 10, 2005·2 cites·4 claims
- 3750US5994001APhase shift mask and its manufacturing method and semiconductor device and its manufacturing method using the phase shift maskMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Nov 30, 1999·11 cites·14 claims
- 3850US2011033656A1Pattern forming method, electronic device manufacturing method and electronic deviceRENESAS ELECTRONICS CORP·Filed 2010·Application pending·0 cites
- 3947US6243159B1Projection aligner and exposure method using the sameMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Jun 5, 2001·8 cites·4 claims
- 4047US5825668AMonitoring method and apparatus of surface area of semiconductor waferMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Oct 20, 1998·7 cites·9 claims
- 4143US2004214095A1Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for deviceRENESAS TECH CORP·Filed 2004·Application pending·0 cites
- 4242US2006183030A1Photomask, method of generating mask pattern, and method of manufacturing semiconductor deviceRENESAS TECH CORP·Filed 2006·Application pending·0 cites
- 4341US2002022353A1Semiconductor device and manufacturing method thereofMITSUBISHI ELECTRIC CORP·Filed 2001·Application pending·0 cites
- 4440US6449386B1Patterned figure resolution verification method and semiconductor pattern forming methodMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Sep 10, 2002·6 cites·15 claims
- 4540US5962172AMethod and apparatus for manufacturing photomask and method of manufacturing a semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Oct 5, 1999·5 cites·6 claims
- 4640US2005069788A1Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomaskRENESAS TECH CORP·Filed 2004·Application pending·0 cites
- 4737US2003203618A1Manufacturing method for semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2002·Application pending·0 cites
- 4836US5597667APhotomask and photomask blankMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Jan 28, 1997·3 cites·4 claims
- 4935US6162736AProcess for fabricating a semiconductor integrated circuit utilizing an exposure methodMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Dec 19, 2000·3 cites·2 claims
- 5031US6426789B1Aligner having shared rotation shaftMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Jul 30, 2002·0 cites·9 claims
Showing the top 50 of 52 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →