Inventor · disambiguated record

Shich-Chang Suen

Also filed as: SUEN SHICH-CHANG

32 granted patents·13 pending applications·135 citations·filing 1997–2025

96Inventor score

Technology areasH10P B24B H10D H10W B24D

Files withTAIWAN SEMICONDUCTOR MFG CO LTD39 TAIWAN SEMICONDUCTOR MFG3 SUEN SHICH-CHANG2 MERCK KANTO ADVANCED CHEMICAL1

Top patents by PatentIndex Score

45 records

0195US9987720B2Method for operating a polishing head and method for polishing a substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 5, 2018·7 cites·20 claims
0295US9352443B2Platen assembly, chemical-mechanical polisher, and method for polishing substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted May 31, 2016·16 cites·19 claims
0394US10164053B1Semiconductor device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 25, 2018·18 cites·20 claims
0494US9630295B2Mechanisms for removing debris from polishing padTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 25, 2017·25 cites·20 claims
0593US10504782B2Fin Field-Effect Transistor device and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 10, 2019·6 cites·20 claims
0691US9209272B2Oxidation and etching post metal gate CMPTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Dec 8, 2015·10 cites·20 claims
0790US9917173B2Oxidation and etching post metal gate CMPTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Mar 13, 2018·5 cites·20 claims
0889US9449841B2Methods and systems for chemical mechanical polish and cleanTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Sep 20, 2016·8 cites·19 claims
0987US9564511B2Oxidation and etching post metal gate CMPTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Feb 7, 2017·4 cites·20 claims
1084US11024540B2Fin field-effect transistor device and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 1, 2021·2 cites·20 claims
1184US9272386B2Polishing head, and chemical-mechanical polishing system for polishing substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Mar 1, 2016·4 cites·20 claims
1284US9076766B2Mechanism for forming metal gate structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Jul 7, 2015·5 cites·20 claims
1381US11996283B2Method for metal gate surface cleanTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 28, 2024·0 cites·20 claims
1480US10967478B2Chemical mechanical polishing apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 6, 2021·2 cites·20 claims
1580US9802292B2Advanced polishing systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Oct 31, 2017·2 cites·20 claims
1680US2025353138A1Chemical-mechanical planarization pad and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
1780US2025269487A1Chemical mechanical polishing apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
1878US2025345896A1Polishing Pad for Chemical Mechanical Polishing and MethodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
1976US12508685B2Semiconductor device fabrication methods and devices for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 30, 2025·0 cites·20 claims
2075US10160088B2Advanced polishing systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 25, 2018·1 cites·20 claims
2174US11410846B2Method for metal gate surface cleanTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 9, 2022·0 cites·20 claims
2274US2024383093A1Apparatus and methods for chemical mechanical polishingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
2372US11728215B2Fin Field-Effect Transistor device and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 15, 2023·0 cites·20 claims
2471US12325102B2Chemical mechanical polishing apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 10, 2025·0 cites·20 claims
2570US9269585B2Method for cleaning metal gate surfaceTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Feb 23, 2016·1 cites·20 claims
2669US2025312889A1Chemical mechanical polishing system with polishing pad height measurement sensor systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
2768US12447580B2Apparatus and methods for chemical mechanical polishingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 21, 2025·0 cites·18 claims
2867US2025312884A1Polishing pad with heat dissipation patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
2966US2023398659A1Polishing Pad for Chemical Mechanical Polishing and MethodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
3065US12427618B2Chemical-mechanical planarization pad and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 30, 2025·0 cites·20 claims
3164US10755934B2Systems and methods for chemical mechanical polish and cleanTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 25, 2020·0 cites·20 claims
3262US2024383092A1Polishing tool and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
3360US10847359B2Method for metal gate surface cleanTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Nov 24, 2020·0 cites·20 claims
3460US6139816AProcess for the preparation of ultra-fine powders of metal oxidesMERCK KANTO ADVANCED CHEMICAL·Filed 1997·Granted Oct 31, 2000·19 cites·9 claims
3560US2023390882A1System, control method and apparatus for chemical mechanical polishingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
3658US11718812B2Post-CMP cleaning composition for germanium-containing substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 8, 2023·0 cites·20 claims
3758US9633832B2Method for metal gate surface cleanTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Apr 25, 2017·0 cites·20 claims
3857US2025339932A1Conditioning pad with deposited diamond coatingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
3955US10515808B2Systems and methods for chemical mechanical polish and cleanTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 24, 2019·0 cites·20 claims
4055US2024429312A1High-k isolation of fin structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
4153US11117239B2Chemical mechanical polishing composition and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 14, 2021·0 cites·20 claims
4252US9553161B2Mechanism for forming metal gate structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 24, 2017·0 cites·20 claims
4343US2015087144A1Apparatus and method of manufacturing metal gate semiconductor deviceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Application pending·0 cites
4432US8703612B2Process for forming contact plugsSUEN SHICH-CHANG·Filed 2011·Granted Apr 22, 2014·0 cites·20 claims
4531US2013061876A1Semiconductor Device Surface CleanSUEN SHICH-CHANG·Filed 2011·Application pending·0 cites

Join the waitlist — get patent alerts

Get an alert when Shich-Chang Suen files or is granted a new patent.

We store only your email — no account needed. See our privacy policy.

Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →