Inventor · disambiguated record
Shuji Sugiyama
Also filed as: SUGIYAMA SHUJI
9 granted patents·1 pending application·240 citations·filing 1982–2002
90Inventor score
Top patents by PatentIndex Score
10 records- 0192US5851381AMethod of refining crude oilIDEMITSU KOSAN CO·Filed 1995·Granted Dec 22, 1998·109 cites·19 claims
- 0286US6509564B1Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application methodHITACHI LTD·Filed 1999·Granted Jan 21, 2003·39 cites·6 claims
- 0378US4477182APattern exposing apparatusHITACHI LTD·Filed 1982·Granted Oct 16, 1984·29 cites·10 claims
- 0473US6768113B2Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application methodHITACHI LTD·Filed 2002·Granted Jul 27, 2004·7 cites·2 claims
- 0565US4690529AOptical exposerHITACHI LTD·Filed 1984·Granted Sep 1, 1987·29 cites·16 claims
- 0646US4941745AProjection aligner for fabricating semiconductor device having projection opticsHITACHI LTD·Filed 1988·Granted Jul 17, 1990·8 cites·8 claims
- 0744US4615614AOptical exposure apparatusHITACHI LTD·Filed 1984·Granted Oct 7, 1986·8 cites·8 claims
- 0844US2003111616A1Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application methodHITACHI LTD·Filed 2002·Application pending·0 cites
- 0939US5214493AReduction exposure apparatus with correction for alignment light having inhomogeneous intensity distributionHITACHI LTD·Filed 1991·Granted May 25, 1993·6 cites·14 claims
- 1034US5164789AMethod and apparatus for measuring minute displacement by subject light diffracted and reflected from a grating to heterodyne interferenceHITACHI LTD·Filed 1991·Granted Nov 17, 1992·5 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →