Inventor · disambiguated record
Shin-Yi Tsai
Also filed as: TSAI SHIN-YI
11 granted patents·5 pending applications·163 citations·filing 2001–2004
90Inventor score
Files withMACRONIX INT CO LTD14
Top patents by PatentIndex Score
16 records- 0192US6750150B2Method for reducing dimensions between patterns on a photoresistMACRONIX INT CO LTD·Filed 2001·Granted Jun 15, 2004·58 cites·21 claims
- 0283US6500767B2Method of etching semiconductor metallic layerMACRONIX INT CO LTD·Filed 2001·Granted Dec 31, 2002·48 cites·19 claims
- 0370US6511902B1Fabrication method for forming rounded corner of contact window and via by two-step light etching techniqueMACRONIX INT CO LTD·Filed 2002·Granted Jan 28, 2003·13 cites·12 claims
- 0468US6601596B2Apparatus for cleaning a wafer with shearing stress from slab with curved portionMACRONIX INT CO LTD·Filed 2001·Granted Aug 5, 2003·8 cites·10 claims
- 0567US7033948B2Method for reducing dimensions between patterns on a photoresistMACRONIX INT CO LTD·Filed 2003·Granted Apr 25, 2006·9 cites·6 claims
- 0664US7105099B2Method of reducing pattern pitch in integrated circuitsMACRONIX INT CO LTD·Filed 2004·Granted Sep 12, 2006·9 cites·22 claims
- 0761US6790772B2Dual damascene processing method using silicon rich oxide layer thereof and its structureMACRONIX INT CO LTD·Filed 2002·Granted Sep 14, 2004·11 cites·20 claims
- 0854US7361604B2Method for reducing dimensions between patterns on a hardmaskMACRONIX INT CO LTD·Filed 2003·Granted Apr 22, 2008·4 cites·28 claims
- 0948US6492214B2Method of fabricating an insulating layerMACRONIX INT CO LTD·Filed 2002·Granted Dec 10, 2002·3 cites·12 claims
- 1041US2002134935A1Inspection method to check contact hole open after contact etchingFiled 2001·Application pending·0 cites
- 1139US2003008503A1Chamber conditioning methodMACRONIX INT CO LTD·Filed 2001·Application pending·0 cites
- 1238US7303995B2Method for reducing dimensions between patterns on a photoresistMACRONIX INT CO LTD·Filed 2003·Granted Dec 4, 2007·0 cites·13 claims
- 1338US2003224254A1Method for reducing dimensions between patterns on a photomaskMACRONIX INT CO LTD·Filed 2003·Application pending·0 cites
- 1437US6635579B2Operating method of a semiconductor etcherMACRONIX INT CO LTD·Filed 2001·Granted Oct 21, 2003·0 cites·5 claims
- 1536US2003186555A1Utilizing chemical dry etching for forming rounded corner in shallow trench isolation processFiled 2002·Application pending·0 cites
- 1632US2002160603A1Method for forming salicide protected circuit with organic materialMACRONIX INT CO LTD·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →