Inventor · disambiguated record
Shigeyuki Uzawa
Also filed as: UZAWA SHIGEYUKI
30 granted patents·1 pending application·924 citations·filing 1993–2010
98Inventor score
Files withCANON KK30
Top patents by PatentIndex Score
31 records- 0195US6307620B1Substrate holding apparatus, substrate transfer system, exposure apparatus, coating apparatus, method for making a device, and method for cleaning a substrate holding sectionCANON KK·Filed 2000·Granted Oct 23, 2001·109 cites·32 claims
- 0292US5543921AAligning method utilizing reliability weighting coefficientsCANON KK·Filed 1995·Granted Aug 6, 1996·96 cites·13 claims
- 0389US6333786B1Aligning methodCANON KK·Filed 1993·Granted Dec 25, 2001·60 cites·2 claims
- 0485US6081614ASurface position detecting method and scanning exposure method using the sameCANON KK·Filed 1996·Granted Jun 27, 2000·59 cites·7 claims
- 0584US5585925AAlignment methodCANON KK·Filed 1995·Granted Dec 17, 1996·60 cites·4 claims
- 0683US6614503B1Projection exposure apparatus, and device manufacturing method which compensate for a change in optical performance of a projection optical systemCANON KK·Filed 2000·Granted Sep 2, 2003·21 cites·21 claims
- 0783US5751404AExposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference platesCANON KK·Filed 1996·Granted May 12, 1998·54 cites·29 claims
- 0882US5499099AAlignment method and alignment systemCANON KK·Filed 1994·Granted Mar 12, 1996·38 cites·20 claims
- 0980US6493062B2Driving apparatus and exposure apparatusCANON KK·Filed 1999·Granted Dec 10, 2002·61 cites·57 claims
- 1080US5695897AAlignment method and semiconductor exposure methodCANON KK·Filed 1995·Granted Dec 9, 1997·48 cites·10 claims
- 1179US5986766AAlignment method and alignment systemCANON KK·Filed 1997·Granted Nov 16, 1999·43 cites·11 claims
- 1277US6359688B2Projection exposure apparatus and method of controlling sameCANON KK·Filed 1999·Granted Mar 19, 2002·40 cites·54 claims
- 1374US7525106B2Exposure apparatus, pressure control method for the same, and device manufacturing methodCANON KK·Filed 2007·Granted Apr 28, 2009·4 cites·17 claims
- 1473US5920398ASurface position detecting method and scanning exposure method using the sameCANON KK·Filed 1997·Granted Jul 6, 1999·43 cites·16 claims
- 1573US5793471AProjection exposure method and apparatus in which scanning exposure is performed in accordance with a shot layout of mask patternsCANON KK·Filed 1996·Granted Aug 11, 1998·35 cites·7 claims
- 1673US5783341AAlignment for layer formation through determination of target values for translation, rotation and magnificationCANON KK·Filed 1997·Granted Jul 21, 1998·33 cites·9 claims
- 1770US6342942B1Exposure apparatus, exposure control method, and device fabrication method using the exposure apparatusCANON KK·Filed 1999·Granted Jan 29, 2002·28 cites·47 claims
- 1868US6342703B1Exposure apparatus, exposure method, and device manufacturing method employing the exposure methodCANON KK·Filed 1999·Granted Jan 29, 2002·26 cites·20 claims
- 1966US6534777B2Surface position detecting system and method having a sensor selectionCANON KK·Filed 2001·Granted Mar 18, 2003·5 cites·12 claims
- 2065US7821726B2Optical element positioning apparatus, projection optical system and exposure apparatusCANON KK·Filed 2008·Granted Oct 26, 2010·3 cites·5 claims
- 2164US7948695B2Optical element positioning apparatus, projection optical system and exposure apparatusCANON KK·Filed 2010·Granted May 24, 2011·1 cites·5 claims
- 2262US6963075B2Scanning exposure apparatus and device manufacturing methodCANON KK·Filed 2001·Granted Nov 8, 2005·4 cites·10 claims
- 2361US6559465B1Surface position detecting method having a detection timing determinationCANON KK·Filed 1997·Granted May 6, 2003·13 cites·18 claims
- 2459US6864953B2Exposure apparatus, device manufacturing method, semiconductor manufacturing plant and method of maintaining exposure apparatusCANON KK·Filed 2001·Granted Mar 8, 2005·5 cites·28 claims
- 2559US6531706B2Surface position detecting system and method having an optimum valueCANON KK·Filed 2001·Granted Mar 11, 2003·3 cites·18 claims
- 2655US7166855B2Surface position detecting system and methodCANON KK·Filed 2003·Granted Jan 23, 2007·2 cites·10 claims
- 2755US6097495AAligning methodCANON KK·Filed 1998·Granted Aug 1, 2000·13 cites·6 claims
- 2842US6271910B1Projection exposure apparatus and methodCANON KK·Filed 1997·Granted Aug 7, 2001·7 cites·12 claims
- 2939US6142660ASemiconductor manufacturing apparatus and command setting methodCANON KK·Filed 1997·Granted Nov 7, 2000·9 cites·18 claims
- 3035US2002011207A1Exposure apparatus, coating/developing system, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance methodFiled 2001·Application pending·0 cites
- 3131US6473158B2Exposure method and exposure apparatusCANON KK·Filed 1999·Granted Oct 29, 2002·1 cites·24 claims
Join the waitlist — get patent alerts
Get an alert when Shigeyuki Uzawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →