Inventor · disambiguated record
Sheng-Hsuan Wei
Also filed as: WEI SHENG HSUAN
9 granted patents·2 pending applications·38 citations·filing 2016–2023
86Inventor score
Top patents by PatentIndex Score
11 records- 0195US9653348B1Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 16, 2017·23 cites·20 claims
- 0286US10157843B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 18, 2018·3 cites·20 claims
- 0386US9852992B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 26, 2017·3 cites·20 claims
- 0484US10879179B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 29, 2020·2 cites·20 claims
- 0584US9881870B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 30, 2018·3 cites·20 claims
- 0683US11081445B2Semiconductor device comprising air gaps having different configurationsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 3, 2021·2 cites·20 claims
- 0774US11180719B2Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or belowBASF SE·Filed 2018·Granted Nov 23, 2021·2 cites·15 claims
- 0873US11355436B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 7, 2022·0 cites·20 claims
- 0971US11676895B2Semiconductor device comprising air gaps having different configurationsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 13, 2023·0 cites·20 claims
- 1052US2025305152A1Composition, its use and a process for cleaning substrates comprising cobalt and copperBASF SE·Filed 2023·Application pending·0 cites
- 1139US2022169956A1Composition comprising an ammonia-activated siloxane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or belowBASF SE·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →