Inventor · disambiguated record
Shinn-Sheng Yu
Also filed as: YU SHINN-SHENG
130 granted patents·11 pending applications·3,701 citations·filing 1998–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD78TAIWAN SEMICONDUCTOR MFG54LU YEN-CHENG3YU SHINN-SHENG3HSU PEI-CHENG1
Top patents by PatentIndex Score
141 records- 0199US9869934B2Collector in an extreme ultraviolet lithography system with optimal air curtain protectionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 16, 2018·148 cites·20 claims
- 0299US9869939B2Lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 16, 2018·145 cites·20 claims
- 0399US9618837B2Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Apr 11, 2017·129 cites·20 claims
- 0499US9184054B1Method for integrated circuit patterningTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Nov 10, 2015·786 cites·20 claims
- 0599US8039179B2Integrated circuit layout designTAIWAN SEMICONDUCTOR MFG·Filed 2010·Granted Oct 18, 2011·121 cites·20 claims
- 0698US9823585B2EUV focus monitoring systems and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Nov 21, 2017·28 cites·20 claims
- 0798US9256123B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Feb 9, 2016·365 cites·20 claims
- 0898US8841047B2Extreme ultraviolet lithography process and maskYU SHINN-SHENG·Filed 2012·Granted Sep 23, 2014·326 cites·20 claims
- 0998US8828625B2Extreme ultraviolet lithography mask and multilayer deposition method for fabricating sameLU YEN-CHENG·Filed 2012·Granted Sep 9, 2014·301 cites·20 claims
- 1098US8785084B2Method for mask fabrication and repairLU YEN-CHENG·Filed 2012·Granted Jul 22, 2014·84 cites·20 claims
- 1198US8628897B1Extreme ultraviolet lithography process and maskLU YEN-CHENG·Filed 2012·Granted Jan 14, 2014·97 cites·20 claims
- 1298US7862962B2Integrated circuit layout designTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Jan 4, 2011·46 cites·20 claims
- 1398US6749972B2Optical proximity correction common process window maximization over varying feature pitchTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Jun 15, 2004·216 cites·20 claims
- 1497US12019974B2Geometric mask rule check with favorable and unfavorable zonesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jun 25, 2024·2 cites·20 claims
- 1597US11320747B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 3, 2022·3 cites·20 claims
- 1697US8877409B2Reflective mask and method of making sameHSU PEI-CHENG·Filed 2012·Granted Nov 4, 2014·324 cites·20 claims
- 1797US8791024B1Method to define multiple layer patterns using a single exposureTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 29, 2014·31 cites·27 claims
- 1897US7989355B2Method of pitch halvingTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Aug 2, 2011·58 cites·20 claims
- 1996US11714951B2Geometric mask rule check with favorable and unfavorable zonesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 1, 2023·4 cites·20 claims
- 2096US9488905B2Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 8, 2016·6 cites·20 claims
- 2194US9075313B2Multiple exposures in extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 7, 2015·9 cites·20 claims
- 2294US8765330B2Phase shift mask for extreme ultraviolet lithography and method of fabricating sameSHIH CHIA-TSUNG·Filed 2012·Granted Jul 1, 2014·85 cites·20 claims
- 2393US11709435B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 25, 2023·1 cites·20 claims
- 2493US8241823B2Method of fabrication of a semiconductor device having reduced pitchSHIEH MING-FENG·Filed 2011·Granted Aug 14, 2012·11 cites·20 claims
- 2593US6492073B1Removal of line end shortening in microlithography and mask set for removalTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Dec 10, 2002·59 cites·20 claims
- 2692US9377693B2Collector in an extreme ultraviolet lithography system with optimal air curtain protectionTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Jun 28, 2016·10 cites·20 claims
- 2791US9213232B2Reflective mask and method of making sameTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Dec 15, 2015·5 cites·20 claims
- 2890US10031411B2Pellicle for EUV mask and fabrication thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 24, 2018·3 cites·20 claims
- 2990US9261774B2Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensityTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Feb 16, 2016·4 cites·20 claims
- 3090US9081312B2Method to define multiple layer patterns with a single exposure by E-beam lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 14, 2015·7 cites·22 claims
- 3190US6664011B2Hole printing by packing and unpacking using alternating phase-shifting masksTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Dec 16, 2003·55 cites·61 claims
- 3289US12406130B2Geometric mask rule check with favorable and unfavorable zonesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Sep 2, 2025·0 cites·20 claims
- 3389US10276372B2Method for integrated circuit patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·4 cites·20 claims
- 3488US9664999B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 30, 2017·2 cites·20 claims
- 3587US10162257B2Extreme ultraviolet lithography system, device, and method for printing low pattern density featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·2 cites·20 claims
- 3687US2025298957A1Geometric mask rule check with favorable and unfavorable zonesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3786US12235589B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 25, 2025·0 cites·20 claims
- 3886US9964850B2Method to mitigate defect printability for ID patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted May 8, 2018·3 cites·20 claims
- 3986US9535334B2Extreme ultraviolet lithography process to print low pattern density featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jan 3, 2017·4 cites·19 claims
- 4085US10007174B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 26, 2018·2 cites·20 claims
- 4184US9690186B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 27, 2017·2 cites·20 claims
- 4284US9588419B2Extreme ultraviolet light (EUV) photomasks and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 7, 2017·2 cites·20 claims
- 4384US9316900B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Apr 19, 2016·3 cites·22 claims
- 4484US7732109B2Method and system for improving critical dimension uniformityTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jun 8, 2010·6 cites·21 claims
- 4583US9442384B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 13, 2016·3 cites·20 claims
- 4683US9134604B2Extreme ultraviolet (EUV) mask and method of fabricating the EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Sep 15, 2015·3 cites·20 claims
- 4782US9709884B2EUV mask and manufacturing method by using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 18, 2017·2 cites·20 claims
- 4882US7580129B2Method and system for improving accuracy of critical dimension metrologyTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Aug 25, 2009·8 cites·20 claims
- 4982US5894350AMethod of in line intra-field correction of overlay alignmentTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Apr 13, 1999·49 cites·17 claims
- 5081US2025334993A1Circuit and method employing temporal multiplexing to perform a mac operationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
Showing the top 50 of 141 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →