Inventor · disambiguated record
Shoubin Zhang
Also filed as: ZHANG SHOUBIN
14 granted patents·9 pending applications·60 citations·filing 2002–2017
89Inventor score
Top patents by PatentIndex Score
23 records- 0190US8795489B2Sputtering target and method for producing the sameZHANG SHOUBIN·Filed 2010·Granted Aug 5, 2014·11 cites·8 claims
- 0287US8968491B2Sputtering target and method for producing sameZHANG SHOUBIN·Filed 2011·Granted Mar 3, 2015·6 cites·6 claims
- 0380US9660127B2Sputtering target and method for producing sameZHANG SHOUBIN·Filed 2012·Granted May 23, 2017·3 cites·9 claims
- 0478US8268141B2High-strength sputtering target for forming protective film for optical recording mediumZHANG SHOUBIN·Filed 2007·Granted Sep 18, 2012·3 cites·12 claims
- 0577US7351498B2Lithium ion polymer secondary battery its electrode and method for synthesizing polymer compound in binder used in adhesion layer thereofMITSUBISHI MATERIALS CORP·Filed 2002·Granted Apr 1, 2008·21 cites·30 claims
- 0675US9607812B2Sputtering target and method for producing sameMITSUBISHI MATERIALS CORP·Filed 2013·Granted Mar 28, 2017·2 cites·6 claims
- 0772US8466077B2Sputtering target for forming ZrO2-In2O3 based protective film for optical storage mediumZHANG SHOUBIN·Filed 2008·Granted Jun 18, 2013·2 cites·2 claims
- 0866US7955143B2Electric contactor and electronic equipmentSONY CORP·Filed 2009·Granted Jun 7, 2011·10 cites·5 claims
- 0964US8105467B2High strength sputtering target for forming phosphor film in electroluminescence elementZHANG SHOUBIN·Filed 2006·Granted Jan 31, 2012·2 cites·4 claims
- 1060US9528181B2Sputtering target and method for producing sameZHANG SHOUBIN·Filed 2012·Granted Dec 27, 2016·0 cites·6 claims
- 1155US2015211108A1Sputtering target and producing method thereofMITSUBISHI MATERIALS CORP·Filed 2013·Application pending·0 cites
- 1253US10283332B2Cu—Ga binary alloy sputtering target and method of producing the sameMITSUBISHI MATERIALS CORP·Filed 2013·Granted May 7, 2019·0 cites·6 claims
- 1352US2016056025A1Cylindrical sputtering target and method for manufacturing sameMITSUBISHI MATERIALS CORP·Filed 2014·Application pending·0 cites
- 1449US9988710B2Sputtering target and method for producing sameZHANG SHOUBIN·Filed 2012·Granted Jun 5, 2018·0 cites·7 claims
- 1549US9934949B2Sputtering target and production method of the sameMITSUBISHI MATERIALS CORP·Filed 2014·Granted Apr 3, 2018·0 cites·7 claims
- 1648US10883169B2Sputtering target and method for producing sputtering targetMITSUBISHI MATERIALS CORP·Filed 2016·Granted Jan 5, 2021·0 cites·4 claims
- 1746US2019271069A1Cu-Ga SPUTTERING TARGET AND METHOD OF MANUFACTURING Cu-Ga SPUTTERING TARGETMITSUBISHI MATERIALS CORP·Filed 2017·Application pending·0 cites
- 1846US2016118232A1Sputtering target and method of producing the sameMITSUBISHI MATERIALS CORP·Filed 2014·Application pending·0 cites
- 1942US2019039131A1Sputtering target and method of manufacturing sputtering targetMITSUBISHI MATERIALS CORP·Filed 2017·Application pending·0 cites
- 2041US2016260591A1Sputtering target and method of producing sputtering targetMITSUBISHI MATERIALS CORP·Filed 2015·Application pending·0 cites
- 2139US2017236695A1Cu-Ga SPUTTERING TARGET AND PRODUCTION METHOD FOR Cu-Ga SPUTTERING TARGETMITSUBISHI MATERIALS CORP·Filed 2015·Application pending·0 cites
- 2238US2017178876A1Cu-Ga ALLOY SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAMEMITSUBISHI MATERIALS CORP·Filed 2015·Application pending·0 cites
- 2338US2017298499A1Sputtering target and method for manufacturing sameMITSUBISHI MATERIALS CORP·Filed 2015·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Shoubin Zhang files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →